半導體製程技術是半導體公司競爭力的來源，而製程技術必須與製程管理相輔相成，才能發揮企業優勢以提昇企業競爭力，此外半導體製造系統複雜，管理在生產過程中更是不可或缺，隨著製程的改進與電腦輔助系統的進步，管理者可以藉由績效指標來協助決策，以客觀、有效的衡量目前的生產情況，並優化現況、規劃願景，利用建構指標層級架構有組織的了解指標之間的關係，提供資訊給決策者作為評估績效、製程管制與監控時的參考根據，隨著全球產業競爭越來越激烈，製程管理考量的層面必須越來越廣以解決更大的問題，然而少有文獻同時探討財務指標與現場指標之關係，並同時以這兩種指標作為管理與評估的標準，因此本研究以財務指標為目標，探討其與現場指標之關係以建構指標層級架構，串連財務與現場指標架構其影響關係，使財務指標能由上而下解構成現場指標，而現場指標能由下而上整合而影響財務指標，讓決策者可以了解其因果關係以綜觀全局，針對企業可能會遇到的狀況，例如景氣、價格波動等等，利用龍捲風圖進行多個單因子的敏感度分析，探討在不同的情況下需重視的指標及提出指標管制建議，最後所得的各階段結果建議，亦可以預先知道改善該指標對於目標的影響，使管理者在瞬息萬變的產業情況下仍然能持續追求企業目標、提昇競爭力。

摘要 I
ABSTRACT II
目錄 III
圖目錄 V
表目錄 VIII
表目錄 VIII
第 1 章 序論 1
1.1. 研究背景及動機 1
1.2. 研究目的 3
1.3. 論文架構 4
第 2 章 績效指標文獻回顧 6
2.1. 績效管理 6
2.1.1. 目標管理 6
2.1.2. 平衡計分卡 8
2.1.3. 策略地圖 10
2.1.4. 績效評估小結 12
2.2. 紫式決策分析架構 13
2.3. 半導體廠指標定義與管制 16
2.3.1. 品質( QUALITY)定義與管制 17
2.3.2. 設備總和效率(OVERALL EQUIPMENT EFFECTIVENESS; OEE)定義與管制 17
第 3 章 建構半導體整廠績效指標層級架構與指標管制 19
3.1. 瞭解問題 19
3.2. 界定利基 21
3.3. 架構影響關係 27
3.4. 客觀敘述感受 37
3.5. 综合判斷與主觀衡量 40
3.6. 權衡與決策 42
第 4 章 建構半導體整廠績效指標層級架構與指標管制之數值研究 44
4.1. 瞭解問題 44
4.2. 界定利基 47
4.3. 架構影響關係 47
4.4. 客觀敘述感受 48
4.5. 综合判斷主觀衡量 87
4.1. 權衡與決策 126
第 5 章 結論與未來研究 130

大前研一著、江裕真譯(2006)，新、企業參謀：掌握策略思考與經營的本質，商周，台北市。
陳照明(1999)，實用目標管理，世貿出版社，台北市。
陳儀(2006)，作業基礎成本管理的第一本書，美商麥格羅希爾國際股份有限公司，台北市。譯自Peter, T. (2005), Common Cents:The ABC Performance Breakthrough, The McGraw-Hill Companies, New York City.
劉漢容，陳文魁(2005)，品質管理六標準差式，滄海書局，台中市。
簡禎富、劉志明、溫于平、薛家豪（2000），捷運機廠電聯車維修績效指標建立之研究，捷運技術，第22期，第71-78 頁。
簡禎富、盧裕溢、張盛鴻、郭金錩、陳惠鄉（2001），建構頻譜使用效益評估指標，科技管理學刊，第6卷，第1期，第55-70 頁。
簡禎富、蕭禮明、王興仁（2004），建構半導體製造管理目標層級架構與製造資料之資料挖礦，工業工程學刊，第21卷，第4期，第313-327 頁。
簡禎富（2005），決策分析與管理─全面決策品質提升之架構與方法，雙葉書廊，台北市。
何霖(2007)，比率管理全書─解讀、串聯推動企業運作的關鍵數字，臉譜文化事業股份有限公司，台北市。譯自Walsh, C. (2003), Key Management Ratios: Master the Management Metrics That Drive and Control Your Business, Pearson P T R, New York City.
Baliga, J. (1999), “Advanced process control: soon to be a must,” Semiconductor International, Vol. 22, No. 8, pp.76-88
Bulter, S.W. and J.A. Stefani (1994), “Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry,” IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 2, pp. 193-201.
Charnes, A. and Cooper, W. W., and Rhodes, E. (1978), “Measureing the efficiency of decision making units,” European Jiurnal of Operational Research, Vol. 2, No. 6, pp. 429-444.
Chien, C-F., Chen, H-K., Wu, J-Z. and Hu, C-H. (2007), “Construct the OGE for promoting tool group productivity in semiconductor manufacturing,” International Journal of Production Research, Vol. 45, No. 3, pp.509-524.
de Ron, A. J. and Rooda, J. E. (2005), “Equipment effectiveness: OEE revisited,” IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 1, pp. 190-196.
Drucker, Peter F. (1954), The Practice of Management, Harper & Row, New York
Fare, R., Grosskopf, S., Lindgren, B. and Roos, P. (1992), “Productivity changes in Swedish Pharmacies 1980-1989: A non-parametric Malmquist approach,” Journal of Productivity Analysis, Vol. 3, No. 1-2, pp.85-101.
Feigenbaum, A. V. (1961), Total Quality Control: Engineering and Management, McGraw-Hill, New York
Guo, R., D. Chiang and F. Pai (2007), “A WIP-based exception-management model for integrated circuit back-end production processes”, The International Journal of Advanced Manufacturing, Vol. 33, No. 11-12, pp. 1263-1274.
Hopp, W. J. and Spearman (2000), M. L., Factory Physics: Foundations of Manufacturing Management, 2nd ed., Irwin/McGraw-Hill: Boston, MA
Howard, R. (1988), “Decision Analysis: Practice and Promise”, Management Science, Vol. 34, No. 6, pp. 679-695
Huang, S. H., Dismukes, J., Shi, J., Su, Q., Razzak, M. A., Bodhale, B., and Robinson, E. (2003), “Manufacturing productivity improvement using effectiveness metrics and simulation analysis”, International Journal of Production Research, Vol. 41, No. 3, pp. 513-527.
Kaplan, Robert S. and Norton, David. P. (1992), “The balanced scorecard-measures that drive performance”, Harvard Business Review, Vol. 70, No. 1 (January-February), pp.71-79.
Kaplan, Robert S. and Norton, David. P. (1996), “Using the Scorecard as a Strategic Management System”, Harvard Business Review, Vol. 74, No. 1 (January-February), pp.75-85.
Kaplan, Robert S. and Norton, David. P. (1996), The Balanced Scorecard, Harvard Business School Press, Boston.
Kaplan, Robert S. and Norton, David. P. (2000), “Having Trouble with Your Strategy? Then Map it”, Harvard Business Review, Vol. 78, No. 5, pp.167-176.
Kaplan, Robert S. and Norton, David. P. (2004), Strategy Maps: Coverting Intangible Assets Into Tangible Outcomes, Harvard Business School Press, Boston.
Keeney, R.L. and Raiffa, H. (1993), Decisions with Multiple Objectives: Preferences and Value Tradeoffs, Cambridge University Press, New York. (First printed by Wiley, 1976 )
Kotler, P. (1984), Marketing Management: Analysis, planning and control., Prentice-Hall, Englewood Cliffs, NJ.
Oechsner, R., Pfeffer, M., Pfitzner, L., Binder, H., Muller, E., and Vonderstras, T. (2003), “From overall equipment efficiency (OEE) to overall Fab effectiveness (OFE)”, Material Science and Semiconductor Processing, Vol. 5, pp. 333-339.
Robert C. Leachman and David A. Hodges （1996）, “Benchmarking Semiconductor Manufacturing”, IEEE transactions on semiconductor manufacturing, Vol.9, No.2, pp158-169.
Scott, D. and Pisa, R. (1998), “ Can Overall Factory Effectiveness Prolong Moore’s Law?”, Solid State Technology, Vol. 41, No. 3, pp. 75–82.
SEMI E79-0200, Standard for definition and measurement of equipment productivity. Semiconductor Equipment and Material International, 2000 (Mountain View, CA).
SEMI E10-0701 (2001), Specification for definition and measurement of equipment reliability, availability, and maintainability (RAM). Semiconductor Equipment and Material International, (Mountain View, CA).
SEMI E124-1107 (2003, 2007), Guide for Definition and Calculation of Overall Factory Efficiency (OFE) and Other Associated Factory-Level Productivity Metrics. Semiconductor Equipment and Material International, (San Jose, CA).
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