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  • 學位論文

溫度效應對二元鈦-矽氧化物薄膜電子特性的影響

Temperature Effect on Spatial Evolution of the Electronic Properties of Binary Ti - Si Oxide Thin Films

指導教授 : 張嘉升
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摘要


近年許多科學家積極發展金屬-氧化物薄膜的相關應用,例如金屬-氧化物薄膜做為光吸收層或光催化塗層越來越受到重視,如何提升元件的效率是相當重要的課題。在當今的研究工作中,透過不同的方法改變金屬-氧化物的電子結構以提升元件效率,這些方法涵括利用異質結構創造出雙重能隙結構、透過適當的熱退火處理產生新的結構,或藉由非化學劑量合成所產生的氧空缺等等,增加元件工作效率。本研究的樣品使用分子層沉積方法與不同的熱退火溫度,成長出非化學劑量合成的二元鈦-矽氧化物薄膜,以達到調控金屬氧化物能隙大小與導電性。為了了解退火溫度如何影響樣品結構以及電性,掌握樣品局域的電子特性是相當重要的,這也是本研究工作的研究動機。本研究工作利用剖面掃描穿隧顯微鏡直接針對二元鈦-矽氧化物薄膜進行形貌與電性的量測,透過掃描穿隧能譜結果顯示,經由熱退火方處理樣品具有兩種不同電性結構的相態。研究結果統計在不同退火溫度下兩種相態在薄膜中的分布情形,並探討不同熱退火溫度對二元鈦-矽氧化物薄膜造成的形貌結構與電性的影響。

並列摘要


Recently, many scientists of different fields devote to researches about metal-oxide thin films and related applications. Using metal- oxide thin film as photocatalytic coatings and light absorbing layers has attracted much attention nowadays, so there are many ideas of changing the electronic structure to promote the working efficiency in the metal-oxide thin film system. For example, the dual bandgap structure can be created in hetero-structure. In addition, conductivity and energy bandgap of metal oxides can be modulated thorough oxide vacancies by the non-stoichiometry or by forming new phases through annealing. The sample is binary Ti-Si oxide nano composites thin films (Ti-Si ONC thin films) grown by the molecular layer deposition (MLD). To measure local electronic properties of binary Ti-Si ONC thin film directly, cross sectional scanning tunneling microscopy(XSTM) is used to obtain the local topography and direct electronic information. The results of scanning tunneling spectroscopy (STS) demonstrate that the thin films contain two different electronic behaviors, showing the dual band gap structure in the thin films. This study shows that temperature not only affects the topography and the electronic properties of binary Ti-Si ONC thin films but also produces new phase of TiO2 in the films. Furthermore, the distribution of TiO2 and new phase of TiO2 are exhibited.

參考文獻


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