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  • 學位論文

薄膜太陽能硒化製程中粉塵之暴露評估與影響

Exposure assessment and impact of dust in CIGS thin-film solar manufacturing process

指導教授 : 劉宏信
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摘要


台灣綠色能源產業主要為:太陽光電、風力發電、LED (Light Emitting Diode)照明、綠建築等。其中太陽光電為國內綠色能源產業重要的綠能產業。薄膜太陽能模組為近期興起的產業,尚未有文獻研究指出硒粉塵暴露危害。故本次研究進行薄膜太陽能模組製作硒化製程中粉塵逸散的探討。分析作業區域從事一般作業人員及機台保養作業人員的硒粉塵暴露量。藉此了解作業員工在作業場所暴露於硒粉塵的濃度並給予工程控制或行政管理之暴露改善策略。 本研究使用八階型分徑採樣器(Marple)及總粉塵採樣器(IOM)進行區域採樣,八階型分徑採樣器(Marple)其粒徑(d50)分別為:0.13、0.52、0.96、1.55、3.5、6.0、9.8、14.8、21.3 (μm),濾紙則是使用34mm,截取粒徑為0.5μm的PVC濾紙;總粉塵採樣器(IOM),其濾紙為25mm,截取粒徑為5μm的MCE濾紙。個人採樣則是使用可呼吸性粉塵(旋風分離器)採樣器,其濾紙為30mm,截取粒徑為0.8μm的MCE濾紙。所有的分析方法皆為重量分析法。 第一次至第五次採樣的作業區域平均濃度為9.660 mg/m3、5.226 mg/m3、5.929 mg/m3、6.106 mg/m3、13.371mg/m3,均超過硒的職業暴露限值0.2 mg/m3。硒化製程開始前與過程中並無粉塵逸散情形,但製程結束後腔體開啟後始有粉塵逸散,且在短時間內隨即降低至背景濃度。作業人員的暴露主要發生於每次製程結束例行機台清潔保養。而硒粉塵粒徑大多分佈於d50:0.13~d50:1.55,代表所暴露粉塵進入肺部深層的機率極高。 薄膜太陽能電池硒化製程有潛在金屬與硒粉塵暴露問題,其暴露可以透過輪班制的方式來執行清潔作業,可降低勞工暴露的機率。製程改善方面可以加強機台抽風量或是吹淨次數,來降低粉塵逸散情形。也建議人員作業時配戴有效之個人呼吸防護用具(例如,供氣式呼吸防護具),隔絕與粉塵接觸的機會。

關鍵字

粉塵 薄膜太陽能 硒化製程

並列摘要


Green energy industry in Taiwan are solar,wind farm,LED light and green building. Solar is the most important of green industry in Taiwan. Thin-film solar module is new industry,and wasn’t any study about exposure hazardous for Selenium (Se). This study is to investigate fugitive dust of Selenide process. A descriptive survey design was analysis Se exposure from operator and worker of preventive maintenance. And give engineering or management control that workers exposure concentration in workplace. Environmental sampling by Marple and IOM, the Marple d50 is 0.13、0.52、0.96、1.55、3.5、6.0、9.8、14.8、21.3 (μm), with 34mm,0.5μm PVC filter paper ;and IOM with 25mm, 5μm MCE filter paper. Personal sampling by cyclone with 30mm,0.8μm MCE filter paper.All analysis are gravimetric method. The environmental sampling of concentration was 9.660 mg/m3、5.226mg/m3、5.929 mg/m3、6.106 mg/m3、13.371mg/m3,all over 0.2 mg/m3 the limit of Se.Dust fugitive was not from start and period of Selenide process,but when the chamber open there will star fugitive and decreaseto background concentration period short time.The main exposure of workers is every process of preventive maintenance.Separticle size is d50:0.13~d50:1.55,it means that easy to go into the deep lung. We can reduce dust exposure of metal and Se probability by shift. Improvement fugitive by increase machine extraction ventilation or purgetime.Also wear PPE when working.(Ex. Powered Air Respirator)

參考文獻


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