Corrosion Performance of Ta/Ni Ions Implanted with WO_3/FTO

S. Hoseinzadeh ； A. H. Ramezani

《中國機械工程學刊》 39卷5期 (2018/10) Pp. 501-507

摘要

In the last decades an extensive number of research papers published on Nano chip electrode and cathode electrochromic materials. The surface bombardment with inert gases mainly procreate structural modifications, developing topography and morphology that atomic force microscopy (AFM) analysis reveals significant differences on the surface. In this article, the efficacy of Tantalum (Ta), Nitrogen (Ni), and Tungsten Tri Oxide (WO3) ion implantation on surface structure is perused. The ions’ implantation manner was operated at 30 keV with various doses. The electrical resistance to tantalum corrosion is investigated. The surface topography and nanostructures property were investigated on nanocomposite by looking at current-voltage curves. In addition to TaN, WO3 powders deposited on fluorine-doped tin oxide (FTO)-coated glass with using the physical vapor deposition (PVD) apparatus are determined as an Electrochromic devices (ECD). Following The change of surface morphology, roughness, corrosion resistance is evaluated by using the (AFM) and Energy Dispersive X-Ray (EDX) analysis plus, the elemental composition is characterized by energy-dispersive X-ray (XRD) and electrical resistance analysis. Consequently, Ta-Ni-n type WO3 with more trap centers (rough surface) can be suggested as a future of ECD and Nano devices.

關鍵字

Corrosion ； Nano composite ； Ion implantation ； TaN ； AFM