鈦氮化物薄膜之微結構與特性研究

A Study on the Coatings and Characteristics of Ti Metal Nitride

汪宙緯(Z.W. Wang) ； 謝昀阳(Y.Y. Hsieh) ； 鍾震桂(C.K. Chung)

《防蝕工程》 30卷2期 (2016/06) Pp. 24-27

https://doi.org/10.6376/JCCE.201606_30(2).0003

摘要

二元過渡金屬氮化物薄膜，如鈦(Ti)及氮化鈦(TiN)的良好性能已受到人們廣大關注，且Ti / TiN所形成的雙層複合膜被預期成為多功能材料，氮化鈦薄膜透過氣體流量比 氮氣/(氬氣+氮氣) = 10％，並使用直流式反應磁控濺鍍系統將雙層複合膜沉積在Si wafer和SS316L表面上，本研究透過Ｘ光繞射儀(XRD)、掃描式電子顯微鏡、四點探針、恆電位儀、電化學阻抗譜、薄膜厚度輪廓測量儀等方法研究了添加Ti輔助附著層對Ti氮化物膜的微觀結構、形貌、電學性能和電化學性能的影響，結果可知Ti / TiN雙層薄膜微結構比單一的TiN膜層更穩定，且當金屬膜為氮化物膜時，膜的電阻率增加，最後可以觀察到雙層膜表現出有較好的耐腐蝕性，其SEM形貌顯示更平滑，可知具有更密型態的雙層結構有利於耐腐蝕性提升。

關鍵字

鈦 ； 氮化鈦 ； 氮化物 ； 電阻率 ； 耐腐蝕性

並列摘要

The good properties of binary transition metal nitride films such as titanium nitride(TiN) have attracted attentions. The combination of bilayer Ti and TiN is expected to create a multi-functional material. The titanium nitride films with N_2/(Ar+N_2) gas flow ratios 10% is deposited the bi-layers structure by dc reactive magnetron co-sputtering on Si(100) substrates and SS316L. The effect of adding Ti adhesive layer on the microstructure, morphology, electrical properties, and electrochemical properties of the Ti nitride films are investigated by means of X-ray diffraction(XRD), scanning electron microscopy(SEM), four-probe method, potentiostatic, and electrochemical impedance spectroscopy, respectively. The microstructure of bilayer TiN films is more stable than single TiN films. The film's resistivity increases when metal film becomes nitride film. Then the bilayer exhibited the good corrosion resistance and the SEM image of the morphology showed smoother. Our studies suggested that the bilayer structure with the denser morphology is beneficial to corrosion resistance.

並列關鍵字

Failure analysis ； Lead acid battery ； Corrosion

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