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The Improvement on Light Efficiency of Anti-Reflection Films by a DC Ion Source Sputter System in LCD Applications

並列摘要


In this paper we use the DC reactive magnetic with ion source sputtering system to deposit the high packing density and smooth interface Anti-Reflection (AR) films at 80℃. And we use the AR Coating on the B270 glass substrate to improve the visible range of lights transmittance average from 91.2% advanced to 95.2%. By using atomic force microscope (AFM) to identify the surface of the sputtered Nb2O5 films, we found that films’ roughness is 0.185nm.

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