離子束製程技術簡介（上）

Introduction to Ion Beam Processing Technology (I)

潘漢昌(Han-Chang Pan) ； 蘇健穎(Chien-Ying Su) ； 蕭健男(Chien-Nan Hsiao)

《科儀新知》 154期 (2006/10) Pp. 59-67

https://doi.org/10.29662/IT.200610.0007

摘要

本文介紹各項離子束製程技術原理與離子束作用對功能性薄膜的特性影響，其中包括應用高能離子束輔助濺鍍與蒸鍍、化學氣相沉積、反應式蝕刻與高分子表面改質等製程技術，文中並介紹高能量粒子在製程中與薄膜之問相互作用時所造成的物理與化學性質變化影響。

並列摘要

A review of various ion beam assisted deposition (TAD) techniques of functional thin film is presented. The different kind of TAD techniques such as, sputtering and evaporation, chemical vapor deposition, reactive etching, and polymer surface modification are discussed. This is followed by a discussion of physical and chemical properties in use to explain ion-to-film interaction in the ion beam assisted process.