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薄膜光學特性之分析模組技術

Optical Characteristics Monitoring and Analysis Technologies for Thin Films

摘要


近年來,OLED相關產業快速發展,薄膜材料、元件結構及薄膜厚度等皆會影響OLED元件的特性,其中對於薄膜厚度精準度的要求,需搭配不同量測系統來進行監測。除了傳統採用石英振盪式膜厚監控系統監測鍍膜速率與膜厚變化外,我們開發具有高準確性的光學薄膜檢測方法來監控薄膜特性的變化,此法具有量測速度較快、非接觸薄膜表面與非破壞薄膜結構等特性,未來可將該模組裝置於真空鍍膜腔體上,使真空鍍膜設備具備即時測量薄膜光學特性的功能,可優化鍍膜製程及進行薄膜品質監控。

並列摘要


OLED-related industries have grown swiftly in recent years. The thin film materials, device structure and film thickness all affect characteristics of OLED devices. Among them, accuracy of thin film thickness need to be monitored with different measurement systems. Apart from the traditional method using quartz oscillation film thickness monitoring system to measure the coating rate and thin film thickness, we have developed an optical film measurement method with high accuracy to monitor changes in the thin film characteristics. This method has several advantages, for example, faster measurement speed, non-contact film surface, non-destructive film structure and so on. In the future, the module can be installed on the vacuum coating equipment for in-situ measurement of the optical properties of the thin film, and to optimize the coating process and thin film quality.

參考文獻


http://www.china-led.net/news/201602/19/32433.html
http://www.most.gov.cn/
https://energy.gov/
Celii, Francis G.,Harton, Tracy B.,Phillips, O.Faye(1997).Characterization of organic thin films for OLEDs using Spectroscopic Ellipsometry.Journal of Electronic Materials.26,366.
https://www.sentech.com/en/spectroscopic-ellipsometry__2298/

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