半導體製程重中之重－微影技術的突破與創新

微影製程的目的是為了在晶圓上製作圖樣，隨著電晶體密度更高，結構更細緻、更複雜，使得曝光、光罩和相對應的量檢測設備更加重要。全球的領導設備商，都希望在下世代微影製程所需的關鍵模組或技術可以突破與創新。中國和韓國也積極改變關鍵設備依賴進口的現況，投入曝光機、光罩保護膜自動化設備等領域。我國在微影設備目前以學校和法人團隊開發為主，廠商投入不多。因此本文期待透過呈現曝光設備市場和技術發展趨勢、全球微影製程生態系，比較中國、韓國、臺灣微影製程設備技術動態，協助我國有意願投資微影製程之業者，找到適合發展的產品與機會。

關鍵字

半導體微影製程；曝光機；光罩

並列摘要

The purpose of lithography process is to define the patterns on the wafer. With higher density of transistors and more detailed and complex structures, the lithographic exposure equipment, mask and the corresponding inspection equipment become more important. The entire world's leading equipment vendors hope to make breakthroughs and innovations in key modules or technologies that required for the next-generation lithography process. China and South Korea are also actively changing the current situation of relying on imports of key equipment, and invested in exposure machines, mask automation equipment and other fields. Currently, lithography equipment in Taiwan is mainly developed by universities and research institution teams, not many manufacturers involved. The purpose of this article is to help the Taiwan companies that willing to invest in lithography to find suitable products and opportunities through introducing the global lithography system and exposure equipment market, technology development trends, and compare the related technology status in China, South Korea, and Taiwan.