In the semiconductor industry, the vacuum pump is one of the key equipment for exhaust gas treatment. The particle generated by the wafer process often reduces the efficiency of the exhaust gas treatment equipment or shuts down without warning. As far as the vacuum pump is concerned, the increase in the amount of particle leads to a decrease in the pumping efficiency of the vacuum chamber and increase the pressure. The rise of the particle makes the particle recharge to the front-stage pumping system and affects the process yield. Due to the particle accumulation in the vacuum chamber, the rotor is stuck or the chamber is worn, which makes the condition monitoring of the vacuum pump more and more important. The goal of this article is to establish an indicator of the health status of the vacuum pump and estimate the remaining life of the vacuum pump. It provides an intuitive and simple indicator that can judge the current status of the vacuum pump and the remaining operating hours no need to interpretation by professionals, so as to reduce the premature maintenance of the vacuum pump, and reduce the production costs derived from unplanned and unwarranted trips.