摘要
本研究針對光阻劑生產過程中產生之寡聚體，探討其性質、組成成分及生成原因，將該寡聚體以火焰燃燒和溶劑溶解法研究其可能成分，以DSC 、IR光譜儀和SEM等儀器探討其物理性質。發現寡聚體生成的因素可能為未溶解PAC、微塵沙粒、樹酯中不溶物和Novolak凝聚而成，而避免寡聚體形成的方法為Novolak合成過程中降低其反應溫度、光阻劑生產時提高Novolak比例、採用低酯化率PAC和生產前先將Novolak溶解並進行過濾，以去除Novolak中的不溶物。
關鍵字
光阻劑並列摘要
The properties, component and source of the gel formed in the manufacture process of photoresist have been investigated. The components were studied and analyzed by burning and dissolving the gel. DSC, IR spectrometer and SEM were used to discuss it’s physical properties. The source of the gel is likely a coagulation constructed, from non-dissolved PAC, dust, insoluble component in the resin and Novolak. The way to avoid the forming of gel was also studied here. It includes that decreased the temperature during the producing of the Novolak, raised the ratio of the Novolak and utilized low-esterification-ratio PAC. Dissolving and filtrating the Novolak before the manufacturing process, was also used to separate the insoluble component.
並列關鍵字
Photoresist參考文獻
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參考文獻