利用熱燈絲化學氣相法成長超奈米鑽石之研究

Growth of Ultrananocrystalline Diamond Using Hot Filament Chemical Vapor Deposition

簡顥(HAO CHIEN)

指導教授 ： 蔡東昇

中原大學/電機資訊學院/電子工程學系/碩士(2024年)

https://doi.org/10.6840/cycu202400833

摘要

這項研究採用了熱燈絲化學氣相沉積(hot filament chemical vapor deposition, HFCVD) 在在矽(100)基板上合成超奈米晶鑽石(ultrananocrystalline diamond, UNCD)。我們變化CH4/H2流量比、背景壓力和生長時間來成長UNCD。在HFCVD製程之後，我們利用拉曼光譜來分析UNCD，並使用掃描電子顯微鏡(scanning electron microscopy, SEM)觀察其表面形態。由於UNCD的拉曼特徵峰分別為1160、1250、1332和1480 cm-1，因此，我們首先旨在優化合成參數，以獲得UNCD樣品最明顯的拉曼特徵。根據拉曼測量，合成UNCD的最佳參數為背景壓力3 torrs，H2/CH4流量比為98/2，生長時間為5 hrs。此外，在UNCD的XRD (X光繞射)光譜中還顯示了典型的鑽石(111)、(220)和(311)峰，進一步確認了結晶品質。在螢光(photoluminescence, PL)光譜分析中發現UNCD具有氮-空缺中心(nitrogen-vacancy centers)。
根據以上結果所示，我們成功透過低成本的HFCVD合成了UNCD。這種簡單的方法可加速UNCD在各種應用中的開發，包括微機電系統(microelectromechanical systems, MEMS)、生物醫學影像與量子計算。

關鍵字

熱燈絲化學氣相沉積 ； 拉曼光譜 ； 掃描電子顯微鏡 ； 超奈米鑽石 ； X射線繞射

並列摘要

This study employs hot filament chemical vapor deposition (HFCVD) for the synthesis of ultrananocrystalline diamond (UNCD) on Si (100) substrates. We varied the CH4/H2 flow rate ratio, background pressure, and growth time to deposit UNCD. After the HFCVD processes, UNCD were characterized by Raman spectroscopy, and then their surface morphology was observed using scanning electron microscopy (SEM). Since the Raman characteristics of UNCD are 1160, 1250, 1332, and 1480 cm-1, respectively, therefore, we first aimed to optimize the synthesis parameters for obtaining the most obvious Raman characteristics of UNCD samples. According to the Raman measurement, the optimal parameters for synthesizing UNCD are a background pressure of 3 torrs, an H2/CH4 flow rate ratio of 98/2, and a growth time of 5 hours, respectively. Furthermore, the typical diamond (1 1 1), (2 2 0), and (3 1 1) peaks are also shown in the XRD (X-ray diffraction) spectrum of UNCD to further confirm the crystalline quality. Nitrogen-vacancy centers (NV centers) are observed in the UNCD based on the photoluminescence (PL) spectrum.
According to the above results, we successfully synthesized UNCD using low-cost HFCVD. This simple method may accelerate the development of UNCD for a wide range of applications, including MEMS (microelectromechanical systems), biomedical images, and quantum computing.

並列關鍵字

Hot filament chemical vapor deposition (HFCVD) ； Raman spectrum ； Scanning Electron Microscope (SEM) ； Ultrananocrystalline diamond ； X-ray diffractometer (XRD)

參考文獻

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