- 學位論文
以射頻磁控濺鍍法製備二氧化鈦光觸媒玻璃之製程參數與特性研究
Process Parameters and Thin Film Properties for Titania Photocatalytic Glass by RF magnetron sputtering
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摘要
本研究以射頻磁控濺鍍法（RF magnetron sputtering），使用高純度金屬鈦為 靶材，利用一階氧化製程且不另外加熱方式將二氧化鈦（Titania, TiO2）薄膜直 接沉積於玻璃基材上，成功製作出TiO2 光觸媒玻璃。藉由氣氛比例、氣體流量 與沉積時間之參數改變，探討實驗參數對TiO2 薄膜結構與特性的影響。利用XRD、 HR-FESEM、AFM 等儀器進行量測並分析製程參數 與薄膜特性關係，篩選出較 佳的鍍膜參數，作為後續光催化特性實驗的樣本。接著利用光譜儀配合亞甲基藍 污染物與接觸角量測儀進行鍍膜玻璃之光學、親疏水與光催化降解污染物的特性 量測，相關特性實驗結果配合第一次篩選出的鍍膜參數，即可決定最佳鍍膜參數， 提供後續鍍膜玻璃對於太陽能電池輸出性能影響之研究使用。實驗結果顯示，鍍 膜玻璃在紫/紅外線波段的穿透值有明顯下降，顯示鍍膜具有抗紫/紅外線的性能。 在水滴接觸角量測方面，證明製備的二氧化鈦薄膜具光致超親水特性，接觸角最 佳可達3.58 度。在光催化降解亞甲基藍實驗方面，最佳樣本的亞甲基藍降解率 可提昇至對照組的4 倍。最後在鍍膜玻璃對於太陽能電池輸出性能影響方面，鍍 膜玻璃可降低太陽能電池表面溫度與提升太陽能電池的輸出性能。未來將利用此 最佳薄膜製程參數，能夠應用於製造小範圍且具極高實用性的相關產品。
並列摘要
In this study, radio frequency (RF) magnetron sputtering is used for the successful production of thin films of titania (TiO2) on glass substrates using a highly pure Ti target without additional external heating in a one-stage oxidation process. The effects of the O2 and Ar flow ratio, gas flow, and deposition time on the structure and characteristics of TiO2 thin films are studied, and the relationship between these parameters and the film properties are investigated by X-Ray Diffraction (XRD), High Resolution Field Emission Scanning Electron Microscope (HR-FESEM), Atomic Force Microscope (AFM), and other equipment. The optimal coating parameters are selected a photocatalytic properties experiments. In addition, the degradation of the methylene blue aqueous solution and the water contact angle are used to evaluate the optical characteristics, and the hydrophilic, hydrophobic, and photocatalytic degradation of pollutants for TiO2 thin films. The first screening of the coating parameters can determine the optimal process parameters for TiO2 coated glass in solar cell output performance experiments.
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