- 學位論文
從半導體專利技術看浸潤微影及極紫外光源微影之發展
The development of immersion lithography and Extreme ultraviolet lithography in view of semiconductor technology patent
摘要
半導體產業是一個需要高度技術和創新的產業，其中浸潤微影技術的使用是讓摩爾定律得以在21世紀延續的重要里程碑。業界從2003年起採用浸潤微影技術，至今仍是主流的高階微影技術。另一方面，極紫外光源微影是近年來被認為有足夠的發展潛力接續在浸潤微影之後成為新一代的先進微影技術，相關產業已競相投入開發以期待運用在大規模生產，採用極紫外光源微影以突破下一個技術節點似乎顯得勢在必行。 本研究主要利用美國專利資料庫的特定範圍資料，以「浸潤微影技術」及「極紫外光源微影技術」二個主題，分別評估該二個技術的整體專利趨勢與技術功效矩陣，從巨觀的專利趨勢逐步漸縮到微觀的特定個案分析，並以ASML公司作為主要分析對象，由此了解特定技術領域的專利資訊所揭露之情報。本研究以專利的角度觀察歷年申請趨勢、技術生命週期，分類次階領域技術、尋找專利的核心目標功效，據以推斷公司的研發方向以及專利布局等，並推測技術未來走向。本研究可作為企業對產業發展的策略參考，也可作為研究者與技術人員的研發方向資訊。
並列摘要
Semiconductor industry is an industry that requires highly technology and innovation. The use of immersion lithography technology is an important milestone for Moore's Law to continue in the 21st century. The immersion lithography technology has been adopted since 2003, which is still the mainstream high-order lithography technology. On the other hand, Extreme ultraviolet lithography is considered to have sufficient development potential in recent years to become a new generation of advanced lithography technology after the immersion lithography. Related industries have been competing for development and expect to adopt EUVL in high-volume manufacturing. It is seems to be imperative that adopting Extreme ultraviolet lithography to break through the next technology node. This study mainly adopts the specific scope of the U.S. patent database to evaluate the overall patent trends and the technology-function matrix of two technologies, "immersion lithography technology" and " Extreme ultraviolet lithography technology". The patent tendency of macroscopic is gradually to a microscopic analysis of the particular case, and ASML company is the main analysis object to understand the information disclosed in the patent information of specific technology fields. In this study, the application trends over the years and technology life cycles from the perspective of patents are observed, the sub-domain technologies are classified, and the core objectives of patents are found. Based on this, the R&D direction and patent portfolio of companies are inferred, and the future of technology is speculated. This study can serve as a strategic reference for the development of the industry, and can also serve as a research and development direction for researchers and technicians.