- 學位論文
氣相層析電子捕捉偵測器分析無塵室中碳氟化合物氣體之監控系統建立
Establish a monitor system for control fluorocarbon gas pollution with Gas Chromatography Electron Capture Detection
摘要
摘 要 半導體產業中AMC(Airborne Molecular Contamination)微污染環境監控項目分為四大類，分別為MA、MB、MC、MD。本研究以MC中之碳氟化合物有機污染氣體為研究主題，於研究中建立自動監測方法，進行實廠量測驗證並據此研擬洩漏改善方案。研究分析某半導體大廠現行監控模式，提出以氣相層析電子捕捉偵測器(GC-ECD)作為監測儀器，配合自動化採樣系統建立新監控模式，測試GC-ECD最佳設定條件，進而建立碳氟化合物有機污染氣體濃度檢量線。同步以氣相層析質譜儀(GC-MS)與PICARRO G2205驗證濃度量測趨勢。最後，實廠量測監控數據，以驗證所建立監測方法的可行性，並建立濃度分布圖，於監測結果異常位置列舉改善方法改善洩漏源與分析其改善效率，最後進行調整前後的監測模式之成本效益比較。
並列摘要
In semiconductor industry, AMC system contains four control items, MA/MB/MC/MD, where MA/MB means acid-base substances, MC means organic substances, MD means boron and phosphorus particles. In this study, the organic pollution gas of fluorocarbons in MC is the research theme, and an automatic monitoring method is established. The field measurement verification is carried out and the leakage improvement scheme is developed accordingly. This study analyzes the current monitoring mode of a large semiconductor plant, and proposes to use the gas chromatography-electronic capture detector (GC-ECD) as the monitoring instrument. A new monitoring mode with the automated sampling system is established and tested. The best setting conditions of GC-ECD and the calibration curve of the fluorocarbon organic pollution gas are established. The results are verified with the concentration measurements of a gas chromatography-mass spectrometer (GC-MS) and PICARRO G2205. Finally, the field monitoring data are used to verify the feasibility of the established monitoring method using GC-ECD. Based on the concentration distribution map, the abnormal location of the monitoring results is identified as the leakage source. Its improvement strategies are then evaluated for the control efficiency based on the monitoring results. Finally, the cost-effectiveness of the new and old monitoring modes are compared.