氮化鉻鍍膜的相變化研究

Phase Transformation in CrN Films

陳弘穎(H. Y. Chen) ； 呂福興(F. H. Lu)

《材料科學與工程》 34卷4期 (2002/12) Pp. 246-250

https://doi.org/10.6409/JMSE.200212.0246

摘要

氮化鉻薄膜是採用陰極電弧電漿沈積法鍍著於矽基材上，接著置於N2/H2=9的氣氛中在400-1200ºC下退火處理2小時。X光繞射結果顯示在溫度高於1100ºC及介於500-700ºC時，氮化鉻膜均會部分相變化成Cr2N。溫度大於1100ºC的相變乃肇因於在此溫度Cr2N為熱力學平衡相，而在500-700ºC間之相變，由即時的應力量測、氮化鉻粉末及經預退火的氮化鉻薄膜相互比較之下，此一相變的成因是為薄膜內殘留應力大量地鬆弛所導致。

關鍵字

氮化鉻 ； 退炎 ； 相變化 ； 應力鬆弛

並列摘要

The phase transformation in chromium nitride films was investigated in N2/H2=9atmosphere over 400ºC to 1200ºC for 2hr. X-ray diffraction results showed that CrN transformed partly into Cr2N at temperatures above 1100ºC and between 500ºC and 700ºC. Cr2N occurring above 1100ºC can be explained by thermodynamics. Nevertheless, thermodynamics cannot explain the formation of Cr2N at temperatures between 500ºC and 700ºC. From in-situ laser curvature measurements, the residual stress of the film was found to relax largely in such a low temperature range. Moreover, additional Cr2N phase could not be found in the preannealed powders and films. Hence, stress-relaxation induced phase transformation would govern the phase transformation at the low temperatures.

並列關鍵字

CrN ； Annealing ； Phase transformation ； Stress relaxation