以RF磁控濺鍍法製作氧化鋅一維奈米柱狀結構

Fabrication of One-dimensional ZnO Nanorods by RF Magnetron Sputter

黃俊翰(J. H. Huang) ； 劉全璞(C. P. Liu)

《材料科學與工程》 38卷1期 (2006/03) Pp. 7-10

https://doi.org/10.6409/JMSE.200603.0007

摘要

氧化鋅屬於直接寬能隙半導體(~3.4ev)，由於具有獨特的電性質與光學性質，已經具有許多相關應用，故其性質已被充分的研究；對於新一代的光電產業而言，元件勢必將縮小至奈米等級以達到更高的空間利用率，因此奈米結構的製作將是未來光電產業極重要的一環，而現今氧化鋅奈米結構的製做技術多偏向以化學氣相沉積爲主的研究方式，物理氣相沉積製程則極少被報導；本研究尋找出一種穩定的濺鍍製程，以傾斜角的方式濺鍍於複層薄膜上，控制環境並添加氫氣還原使成爲奈米柱狀結構；此外，對於濺鍍過程中由雜質所引起的異質成核亦做了深入的討論，本研究和一般的化學氣象沉積法相較，具有極佳的控制性與均勻性等等優點。

關鍵字

濺鍍 ； 氧化鋅 ； 奈米結構

並列摘要

ZnO is a wide band-gap material and has been applied in many fields due to its unique electrical and optical properties. For the new-generation opto-electronic devices, toward ever reduced size is a definite trend to improve the performance. Thereby, methods to synthesize nanomaterials will be important in future. However, to date, most ZnO nanostructures were overwhelmly synthsized based on chemical vapor deposition (CVD), and very rare by physical vapor deposition. In this report, we develop a reliable process to fabricate ZnO nanorods by oblique-angle sputtering assisted by hydrogen reduction. The nucleation mechanisms of the sputtered nanorods and other impurities introdiced are discussed. This process is more controllable and the ZnO rods are more uniform than common CVD.

並列關鍵字

sputter ； ZnO ； nanostructure