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濺鍍碳摻雜二氧化鈦薄膜之光觸媒性質

Reactively Sputtered Carbon-doped Titanium Oxide Films as Visible-Light Induced Photocatalyst

摘要


利用磁控濺鍍系統已成功沉積碳摻雜二氧化鈦薄膜,摻雜來源爲使用石墨靶和金屬鈦靶在Ar、O2電漿氣氛下進行共濺鍍,並改變石墨靶靶槍功率來探討TiO(下標 2-x)C(下標 x)薄膜之結晶結構、光吸收性質、成分分析與光催化活性。實驗結果顯示碳摻雜TiO2薄膜的結構仍爲銳鈦礦(Anatase)相,且吸收波長往可見光區位移,最多可位移至約450nm。而TiO(下標 2-x)C(下標 x)薄膜在可見光照射下,具有較純銳鈦礦相二氧化鈦佳的光觸媒活性。從XPS成分分析結果顯示隨著石墨靶靶槍功率增加,摻雜的碳含量也隨之遞增,且吸收波長往可見光區位移量也越多。亞甲基藍溶液分解實驗和銀還原實驗結果也顯示碳含量越高,薄膜的光催化活性也就越高。隨著照光時間增加,TiO(下標 2-x)C(下標 x)薄膜的水接觸角會趨近於0°,展現出極佳的親水性。

並列摘要


Carbon-doped titanium oxide (TiO(subscript 2-x)C(subscript x)) films in anatase structure were deposited on silicon and quartz substrates by reactive magnetron sputtering. A metallic titanium target and a graphite target were co-sputtered simultaneously in a gas mixture of argon and oxygen. The power of Ti target was fixed at 250 W while the power of graphite target varied from 100 W to 350 W. The incorporation of carbon into TiO2 extended the spectral response to the visible region about 450 nm and exhibited visible-light induced photocatalytic properties in the photoreduction of silverions and in the degradation of methylene blue (MB). The photocatalytic activity of TiO(subscript 2-x)C(subscript x) films was relative to the carbon concentration. The best photocatalytic activity is obtained in the film of the most carbon concentration, with a degradation rate-constant (k) about 0.108 hr^(-1) of MB under visible-light illumination, and with superhydrophilicity of water contact angle near zero.

被引用紀錄


蔡淑惠(2011)。具光觸媒特性之TNO透明導電膜研究〔碩士論文,國立中央大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0031-1903201314424695
林政緯(2011)。氮氧化鈦薄膜XPS表面分析〔碩士論文,大同大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0081-3001201315111287

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