不同真空熱壓燒結製程溫度對Cr50Ni50合金其顯微組織與材料特性之影響

Effect of Elevated Vacuum Hot-Press Sintering Process Temperature on the Microstructures and Material Characteristics of Cr50Cu50 alloys

張世賢(S.H. Chang) ； 李健綸(C.L. Li) ； 林頌軒(S.H. Lin) ； 廖振良(C.L. Liao)

《鑛冶：中國鑛冶工程學會會刊》 59卷4期 (2015/12) Pp. 59-66

https://doi.org/10.30069/MM.201512_59(4).0005

摘要

鉻鎳合金(Cr-Ni alloys) 具備有低密度及高強度，廣泛應用於機械零件、航太設備等氣噴式燃氣渦輪機及機身的製備；另一方面，鉻鎳合金靶材若以蒸鍍或濺鍍等方法製備成薄膜，因其具有高可靠性、高電阻及低溫度電阻係數等優越性質，可應用於薄膜電阻、微機電系統的微加熱器與綠能玻璃等產品。此外，真空熱壓燒結是一種結合燒結與加壓成形的複合式粉末冶金技術，在熱壓過程中，透過石墨模具直接將壓力傳遞至粉末，同時進行材料的壓製與燒結，此方法有助於在較低的燒結溫度下，形成較緻密的材料。因此，本研究以24 MPa 之壓力，同時運用不同熱壓燒結溫度(1225、1250、1275 及1300℃) 對Cr50Ni50 合金進行真空熱壓燒結，並對製備出的鉻鎳合金進行一連串的分析討論。其結果顯示，鉻鎳合金在24 MPa 及熱壓時間1 小時下的最佳熱壓溫度為1275℃，此時，該合金之相對密度增加到97.13% 及電導率為1.29×10^4 Scm^(-1)。

關鍵字

鉻鎳合金 ； 熱壓燒結 ； 粉末冶金 ； 電導率

並列摘要

The Cr-Ni alloys having low density and high strength are suitable for machine parts and for aerospace air-breathing gas turbines and airframes. Cr-Ni alloy thin films deposited by evaporation and sputter-deposited processes have high electrical resistivity and low temperature coefficient of resistance. Cr-Ni alloys thin films are widely used in the fabrication of thin film resistors, MEMS-based micro heaters and green energy glasses. Vacuum hot-press sintering is a complex method which combines the sintering and pressing processes. The material is directly pressed and sintered through a graphite mold to transmit the pressure onto the powder to produce a densified material at a relatively low sintering temperature. This study conducted a series of Cr50Ni50 alloy manufacturing at various hot-press sintering temperatures (1,225, 1,250, 1,275 and 1,300℃). The experimental results showed that 1,275℃ at 24 MPa for 1 h of hot-press sintering is optimal for producing Cr50Ni50 alloys. The Cr50Ni50 alloy relative density increased to 97.13% and the electrical conductivity to 1.29×10^4 Scm^(-1).

並列關鍵字

Cr-Ni Alloy ； Hot-Press Sintering ； Powder Metallurgy ； Electric Conductivity