有機半導體薄膜沈積技術及其在電晶體元件的應用

The Deposition Technology of Organic Semiconductor Films and Its Applications for Thin Film Transistors

鄭弘隆(Horng-Long Cheng)

《真空科技》 17卷1期 (2004/07) Pp. 82-88

https://doi.org/10.29808/JVSROC.200407.0013

摘要

本文主要介紹有機小分子半導體薄膜的沈積技術及其在薄膜電晶體元件的應用，有機分子薄膜通常真空熱蒸鍍技術（vacuum thermal evaporation, VTE）與有機氣相沈（organic vapor phase deposition，OVPD）技術製膜，製程參數如基板表面性質、基板溫度、沈積速率，不僅影響有機薄膜的結構與形態學，更是決定電晶體元件性能的關鍵因素，藉由控制有機分子半導體之成長與排列，將具有大幅提昇電晶體元件特性的潛力。

並列摘要

This article presents the deposition technique of organic semiconductors films and its applications on thin film transistors. Organic semiconductor films can be deposited by vacuum thermal evaporation (VTE) and organic vapor phase deposition (OVPD) techniques. The deposition parameters, such as surface properties of substrate, substrate temperature, and deposition rate, etc, that can dramatically affect thin film morphology and thus the transport characteristics of organic thin film transistors. By controlling of the growth and orientation of organic semiconductors, we believe that the performance of organic thin film transistors will be improved.