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The Improvement of ITO Film with High Work Function on OLED Applications

並列摘要


We have successful implement a new way to adjust the work function of indium tin oxide (ITO), which is proved to be a stable way since it only concerns to the partial pressure of the controllable purging gases. With this new method, the work function can increase for more than 0.3eV. Consider the ordinary ionization potential (IP) of the hole transportation layer which is from 5.35 to 5.8eV the increase of ITO work function can reduce the barrier from 40% to 70%.

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被引用紀錄


Yeh, C. Y. (2012). 矽穿孔技術與鰭式場效應電晶體應力源之應力分析 [master's thesis, National Taiwan University]. Airiti Library. https://doi.org/10.6342/NTU.2012.00135

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