以核殼奈米柱結構提升氮摻雜二氧化鈦薄膜之光電響應

Improvement in the Photocurrent Response of N-Doped TiO2 Films by Core-Shell Nanostructure

鄭錫恩(Hsyi-En Cheng) ； 郭彥良(Yen-Liang Kuo) ； 邱南榮(Na-Jung Chiu)

《真空科技》 23卷2期 (2010/06) Pp. 44-49

https://doi.org/10.29808/JVSROC.201006.0008

摘要

本研究以陽極氧化鋁為模板，利用電鍍法成長奈米鎳柱陣列，並在奈米鎳柱陣列上以原子層沉積法被覆一層氮摻雜二氧化鈦薄膜，製備成核殼奈米柱電極。實驗結果顯示原子層沉積法可均勻覆蓋二氧化鈦薄膜在奈米鎳柱上形成核殼奈米柱結構，但因為鎳柱有局部聚集現象造成接觸處無法被覆到二氧化鈦，本研究以二次沉積法解決鎳柱聚集而無法完全被覆的問題。光電化學量測顯示，藉由核殼奈米柱陣列可大幅提升氮摻雜二氧化鈦薄膜在可見光區的光電響應，與平面電極相比時，可見光的光電流響應提高達37倍。

關鍵字

原子層沉積 ； 二氧化鈦 ； 核殼奈米柱

並列摘要

In this study, nickel nanorods were grown in nanoporous alumina templates using electroplating method. An N-doped titanium dioxide thin film was then coated on those nanorods by atomic layer deposition (ALD) to form photoelectrodes. The aggregation of nickel nanorods however resulted in a non-uniform coverage of titanium dioxide film. A two-step ALD was proposed to solve the nonuniform coverage issue. Photoelectrochemical measurements revealed that the photocurrent response of N-doped titanium dioxide film in the visible region was significantly improved by the core-shell nanorod structure. As compared with the flat electrodes, its visible photocurrent was enhanced by almost 37 times.

並列關鍵字

Atomic Layer Deposition ； Titanium Dioxide ； Core-Shell Nanorods