新穎式常壓電漿噴射束製程之應用研究

在20世紀初期，Langmuir等人開始進行電漿現象的研究，並在1929年以「電漿(plasma)」一詞用來敘述離子化氣體的現象。隨著科技日益發展，真空電漿開始大量應用在產業界上，如低壓濺鍍及真空蒸鍍技術等，現今已經成為半導體產業中不可或缺的重要角色。然而真空電漿在使用及操作上仍具有相當的限制，應用的產業領域始終無法突破，為了使電漿應用範圍更加廣泛，常壓電漿(Atmospheric-pressure plasma)的相關技術近年來開始蓬勃發展，成為全球各研究單位的熱門研究項目。本研究團隊使用常壓電漿系統進行相關應用研究，研究內容將分為三個不同項目分別進行探討。首先為以常壓電漿輔助化學氣相沉積之概念進行常壓環境之鍍膜技術評估，透過沉積無機氧化矽膜層於AZ31鎂合金基材上，進而達到抗蝕保護效果。二為高分子材料貼合技術，主要使用常壓電漿設備對聚丙烯等高分子材料進行表面親水性處理，其產生之高表面及親水性能使環氧樹脂與材料表面鍵結因化學鍵結而更加完整，並大幅提升其貼合性。三則為綠色製程於奈米金顆粒製備，探討在不同電漿功率下，前驅物形成顆粒之粒徑尺寸的影響，並提出其奈米顆粒成形機制。綜合此三項研究結果顯示，常壓電漿系統皆能達到預期目標，甚至能超越傳統製程之潛力，進而在未來產業製程中取代其原有生產裝置，並降低製造成本。

關鍵字

常壓電漿；鍍膜；電漿表面改質/活化；奈米顆粒

並列摘要

In the beginning of twentieth century, Langmuir et al. were devoted to the researches on plasma generation and its theory. In 1929, the word ＂Plasma＂ is used to describe the phenomena of gas ionization. As the technology evolved continuously, vacuum plasma is widely used in the industries, such as Sputtering and Evaporation for the semiconductor industries. However, the technology used vacuum plasma still have the limitations on the operation procedures. In order to widen the application of plasma system, the technology based on atmospheric-pressure plasma (APP) was growing quickly and was widely discussed as a hot issue for technology. Our research related to the APP technology is set for three different projects, including the deposition, surface treatment and nanoparticle production. First of all is the deposition of inorganic silica coating as the anticorrosion layer on AZ31 magnesium alloys for improving its corrosion resistance. The second research is to introduce the surface treatment by APP technology to alter the hydrophilicity of polypropylene (PP) polymer substrates for the further adhesion issue. As a result, the high surface energy and hydrophilic characteristic completely enable the chemical bonding of the substrate with the epoxy resin for a better adhesion. The third one is to process the feasibility on the Green chemistry for the preparation of gold nanoparticle by APPJ system. The plasma power was referred to the discussion on the understanding the relationship with the particle size of gold, as well as the formation mechanism. For the researches on these three applications, using APP system is a promising technology with its potential for the costdown on the future manufacturing process.

並列關鍵字

Atmospheric-Pressure Plasma ； Coating ； Plasma Surface Modification/Activation ； Nanoparticle

國際替代計量

新穎式常壓電漿噴射束製程之應用研究

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