以高功率脈衝直流濺鍍技術製作陷波濾光片及其特性檢測

Fabrication and measurement of notch filters based on high-power impulse magnetron sputtering technique

林泓逸(Hong-Yi Lin) ； 田春林(Chuen-Lin Tien) ； 唐謙仁(Chien-Jen Tang)

《真空科技》 32卷3期 (2019/09) Pp. 19~1-19~6

摘要

本文以高功率脈衝直流濺鍍法（high-power impulse magnetron sputtering, HiPIMS）沉積單波段陷波濾光片SiO_2/SiN/SiO_2/(SiON)^(291)與三波段陷波濾光片SiO_2/SiN/(SiON)^(82)於B270玻璃基版。製作完成後的濾光片以不同儀器檢測光學特性、殘留應力與表面微結構。單波段設計可應用於520～530nm波長的光學帶阻（band stop）濾光片，三波段的設計則可對440 nm、530 nm、630 nm三種波長衰減濾光片應用。薄膜應力方面單波段陷波濾光片的薄膜應力為-0.281±0.004 GPa，三波段陷波濾光片的薄膜應力為-0.196±0.004 GPa。單波段陷波濾光片的均方根粗糙度為2.13±0.10 nm，三波段的陷波濾光片為1.03±0.11 nm，結果顯示兩種設計均能達到低殘留應力和低粗糙度。

關鍵字

高功率脈衝直流濺鍍 ； 陷波濾光片 ； 薄膜 ； 殘留應力

並列摘要

In this paper, high-power impulse magnetron sputtering (HiPIMS) is used to deposit single-band notch filter SiO_2/SiN/SiO_2/(SiON)^(291) and three-band notch filter SiO_2/SiN/(SiON)^(82) on the B270 glass substrate. Optical property, residual stress and surface roughness are measured by different instruments. The single-band notch filter design can be applied to optical band stop filter with wavelengths from 520 to 530 nm, and the three-band notch filter design can be applied to three wavelengths of 440 nm, 530 nm, and 630 nm. The film stress of the single-band notch filter is -0.281 ± 0.004 GPa, and the film stress of the three-band notch filter is -0.196 ± 0.004 GPa. The rms surface roughness of the single-band notch filter is 2.13±0.10 nm, and the three-band notch filter is 1.03±0.11 nm. The results show that both designs have low residual stress and low surface roughness.

並列關鍵字

HiPIMS ； notch filter ； thin film ； residual stress