加速器3MeV電子射束史坦佛技術全身放射治療的劑量測量

Dosimetry of 3MeV Electron Beam Total Body Irradiation of Stanford Technique

李玉麟(Yuh-Lin Lee) ； 蔡麗芳(Lih-Fang Tsai) ； 鍾郡栗(June-Lie Chung) ； 王曼肇(Adrian Mann-Tchao Wang) ； 季匡華(Kwan-Hwa Chi) ； 陳光耀(Kuang-Yuang Chen)

《中華放射線醫學雜誌》 12卷1期 (1987/03) Pp. 61-66

摘要

史坦佛技術是電子射束全身放射治療方法中最廣被接受的一種，常治療長在皮膚的T型細胞淋巴腫瘤；例如黴菌贅肉(Mycosis fungoides)和皮膚淋巴瘤(Cutaneous Lymphoma)。此種方法分別使用六個雙照野，由病人的前、後、左前、右前、左後、右後各間隔60度共六個方向照射，每一雙照野由水平向上和向下15度照射；榮民總醫院選擇3MeV電子射束來治療病人，治療距離為3公尺，利用擬人假體(Rando Phantom)及柯達X-omat-V驗證片實驗得電子射束初始能量從3.7Mev變為3.51MeV，六個雙照野之X光污染共達9.5%，使用Capintec劑量表及PS-033型電子射束用游離腔測量六個雙照野，每一監測單位(Monitor unit)相當於0.00127 cGy。把TLD片貼於擬人假體的表面，每一照野照射1316 Monitor unit，前方腰部測得的劑量有195.6cGy，後腰部為200cGy，而右側腰部184cGy，左側腰部179.2cGy。

並列摘要

Stanford technique is a well accepted electron total body treatment method for skin lymphoma such as T-cell cutaneous lymphoma and mycosis fungoides etc. It is treated with six fields (Anterior, Posterior, four obliques) positioned 60° apart around the circumference of the patient, each dual field is made up of two component beams, pointing ±15° with respect to the horizontal. The nominal energy of electron beam produced by Mevatron Ⅻ (Siemens) is 3MeV, and the patient is treated at a distance of 3 meters. Using Capintec dosemeter and PS-033 electron beam chamber for measurement, one moniter unit (m. u.) of radiation is equivalent to 0.0127cGy. Measurement of electron energy by Kodak X-omat-V verification film inside the Rando phantom at 100 cm SSD was 3.70MeV, electron energy measured at 3 meters was 3.51MeV. X-ray contamination was measured as 9.5% per six dual fields. Direct measurement of surface dose of Rando phantom (1,316 m.u./beam) by TLD chips and read by VIN-TEN TLD reader were as follows:
Anterior waist: 195.6cGy Posterior waist: 200.0cGy.
Right lateral waist: 184cGy Left lateral waist: 179.2cGy