晶圓廠空氣中氣態分子污染物之採樣及分析

Sampling and Analysis of AMC in Fab Air

黃覃君(Sylvia Huang)

《科儀新知》 145期 (2005/04) Pp. 54-60

https://doi.org/10.29662/IT.200504.0005

摘要

隨著半導體導線線徑的縮減，氣態分子污染物(AMC)的管制及監控方式也益受重視。本文將介紹氣態分子污染物的定義、對半導體廠可能的影響、其可能來源及檢測時機，及對其常用的離線採樣方法（包括衝擊瓶、吸附管、不鏽鋼採樣瓶、晶圓收集及表面擦拭）與各類AMC的分析方法，並舉二件實例說明AMC分析之實際應用，分別為酸性AMC及硫化物之採樣分析。

並列摘要

The importance of monitoring of airborne molecular contaminants (AMC) has increased with the shrinkage of line width in semiconductor manufacturing. The definition of AMC, their impact on semiconductor production, possible sources, timing for sampling and the off-line technique of sampling (impinger, adsorbent tube, canister, witness wafer and surface wiping) and methods of analysis are introduced. Two application examples are also included, one is MA analysis and the other is sulfur containing compound analysis.