X光繞射分析技術與應用

X-ray Diffraction Analysis: Techniques and Applications

楊仲準(Chun-Chuen Yang)

《科儀新知》 182期 (2011/06) Pp. 64-74

https://doi.org/10.29662/IT.201106.0007

摘要

X光晶體繞射爭為材料科技之一項重要分析技術。自20世紀末以來，由於電腦科技的進步，使得定量化的晶體結構分析變為可能。因此學者可以藉由結構精算而獲得更加精確的晶體參數，並進一步分析材料的特性。本文將由X光粉末／多晶繞射分析技術出發，並藉由所獲得之晶體參數，介紹其延伸應用，以利讀者封於X光晶體繞射有更深一層之認識。

並列摘要

X-ray diffraction is an important technique for the materials analysis. Since the end of 20th century, the improvement of computer technology making the quantitative analysis of the crystal structure becomes reality Scholars can get more accurate crystal parameters of materials with structure refinements, and improve their understanding and analysis. The X-ray powder/polycrystal diffraction analysis techniques and theory will be first introduced in this artic le. Furthermore, applications from these obtained crystal parameters will also be discussed and demonstrated.