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高效率氮化鎵發光二極體成長於奈米壓印技術錐形二氧化矽圖形化基板

Highly Efficient GaN-based Light-emitting Diodes on Cone-shaped SiO2 Patterned Template by Nanoimprint Lithography

摘要


在高效率氮化鎵發光二極體的研究和開發過程中,圖形化藍寶石基板一直扮演著極為重要的角色,它不僅能夠減少缺陷產生以提升磊晶品質,更能有效增加光萃取效率。而本文介紹了一種新穎的圖形化基板,有別於以往直接在藍寶石基板上蝕刻圖形,而是先在藍寶石基板上先沉積一層二氧化矽,並利用奈米壓印技術將一般商用之錐形圖形化藍寶石基板轉印在這層二氧化矽上,之後再將製作好之基板利用有機金屬化學氣相沉積系統成長氮化鎵發光二極體。在後續的分析上,我們也觀察到了使用此新穎二氧化矽圖形化基板作為磊晶基板的獨特處,氮化鎵磊晶層會在錐形二氧化矽側邊形成橫向疊層缺陷,其能夠阻擋在氮化鎵磊晶層中的縱向缺陷向上竄升,以防止缺陷進入主動層破壞其結構。此外我們也利用光線追跡法模擬發光二極體成長在錐形二氧化矽圖形化基板和錐形圖形化藍寶石基板在光萃取效率上的差異,發現成長在錐形二氧化矽圖形化基板上之發光二極體有較佳之出光特性,而元件電特性的量測結果也符合這一趨勢,顯示出成長在錐形二氧化矽圖形化基板上之發光二極體在發光強度和效率上確實有其優勢。

並列摘要


In this study, we successfully transferred the patterns of a cone-shaped patterned sapphire substrate (CPSS) into SiO2 layer to fabricate a cone-shaped SiO2 patterned template by using nanoimprint lithography (NIL). The GaN-based light-emitting diodes (LEDs) were grown on this template by metal-organic chemical vapor deposition (MOCVD). The transmission electron microscopy (TEM) images suggest that the stacking faults formed near the cone-shaped SiO2 patterns during the epitaxial lateral overgrowth (ELOG) can effectively suppress the threading dislocations, which results in an enhancement of internal quantum efficiency. The Monte Carlo ray-tracing simulation reveals that the light extraction efficiency of the LED grown on cone-shaped SiO2 patterned template can be enhanced as compared with the LED grown on CPSS. As a result, the light output power of the LED grown on cone-shaped SiO2 patterned template outperformed the LED grown on CPSS.

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