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(111)奈米雙晶銅的低溫低壓銅-銅直接接合技術

Low-Temperature Direct Copper-to-Copper Bonding by (111) Nanotwinned Cu

摘要


銅對銅可以在溫度為150~250℃,壓力為100psi(0.69 MPa)維持10-60分鐘且真空壓力為10-3 torr直接對接完成。直接對接的關鍵控制參數是銅在(111)表面上有快速的表面擴散速率。其中是使用超過90%高度(111)優選方向的奈米雙晶銅製作成而不是利用(111)單晶銅。在兩個(111)接合完成的接合表面會產生扭型的晶界。假如是低角度晶界則它有六邊形網絡的螺旋錯位。接合的強度可超過175Kgf.此技術有可能是下一代的高階封裝技術。

並列摘要


Cu-to-Cu direct bonding was achieved at temperatures of 150-250℃ using a compressive stress of 100 psi (0.69 MPa) held for 10-60 min at 10-3 torr. The key controlling parameter for direct bonding is fast surface diffusion on (111) surfaces of Cu. Oriented (111) texture of extremely high degree, exceeding 90%, was fabricated using the oriented nanotwinned Cu. The bonded interface between two (111) surfaces forms a twist-type grain boundary. If the grain boundary has a low angle, it has a hexagonal network of screw dislocations. This technology has potential application in next-generation packaging of high-end devices.

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