This research was proposed to utilize sputtering system within ZnO target to fabricate material of electronics nose of ZnO sensor by doping N2, and expected to use it in micro multiple bio-sensor system with intelligent functions in new generation. The first test was material measurement for ZnO deposited on Si substrate. The fixed pressure, growth time, gas flow rate, annealing and growth temperature, and DC applied voltage of sputtering system will be selected to study characteristics of the ZnO sensors with doping of nitrogen.