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六氯矽乙烷水解沉積物混合氫氧化鉀導致增強撞擊爆炸敏感性之研究

The studies on enhancement of impact explosion sensitivity of Hexachlorodisilane hydrolyzed deposit mixed with KOH

摘要


六氯矽乙烷是半導體製程的重要的矽來源之一,但其水解產物具有高度的撞擊敏感性,一旦引燃將產生激烈的燃燒與爆炸。本研究,對於HCDS水解沉積物之撞擊敏感性為6J,發現含有0.04wt.%KOH的乾燥混合物之撞擊敏感性則提高至0.125J。DSC分析結果顯示,在80-150℃之間觀察到一個新的放熱峰,並且伴隨著氫氣的釋放。文獻指出,KOH的存在會導致-Si-Si-O-Si-Si-被分解形成-Si-Si-OH-和-Si-Si-OK,並導致相鄰的Si-Si鍵弱化,任何熱摩擦或撞擊都會導致Si-Si鍵斷裂,從而形成更多的Si-O-Si基團以及H_2氣體和熱量釋放,且生成的氫氣可能會成為次要危害。研究的結果將有助於處置與控制這種具爆炸性固體。

並列摘要


Hexachlorodisialne is one of the silicon source gases for advanced semiconductor manufacturing processes. However, the hexachlorodisialne hydrolyzed deposit is shock sensitive and may generate significant fire and explosion upon ignition. In this work, the effect of KOH on shock and thermal sensitivity of the hexachlorodisialne hydrolyzed deposit was studied. The dried mixtures containing 0.04% KOH by weight were found to be extremely sensitive to impact with a limiting impact energy of 0.125J compared to 6J for the sample without KOH treatment. Differential scanning calorimeter curve showed that a new exothermic peak was observed between 80℃ and 150℃ which is also accompanied by evolution of hydrogen. It is proposed that, the presence of KOH leads to the -Si-Si-O-Si-Si- was broken down to form -Si-Si-OH- and -Si-Si-OK, leading to the weakening of the neighboring Si-Si bonds. Any thermal or mechanical friction or impact will lead to the cleavage of the unstable Si-Si bonds and form more Si-O-Si groups and H_2 gas and heat release. The generated hydrogen may become a secondary hazard. The results will benefit the handling and control the explosive HCDS hydrolyzed deposit.

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