Effect of Impurity Ions on Vanadium Precipitation in Vanadium-rich Solution

Xiaobo Zhu ； Wang Li ； Sen Tang ； Wenzhong Li

《Journal of Mining World Express》 5卷 (2016/03) Pp. 28-37

https://doi.org/10.14355/mwe.2016.05.003

摘要

The impurity ions of phosphorus, silicon, potassium, sodium, iron and aluminum are existed in the vanadium-rich solution obtained from vanadium-bearing titano-magnetite with sodium roasting, water leaching and ion exchange. The impurity ions can affect the precipitation rate of vanadium and the purity of V2O5. Precipitation of vanadium from synthetic vanadium-rich solution containing the impurities has been investigated. The results show that the restrictive concentration of phosphorus, silicon, potassium, sodium, iron and aluminum was 0.02 g/L, 0.5 g/L, 1 g/L, 70 g/L, 2 g/L and 0.8 g/L, respectively. The concentration of phosphorus in the real vanadium-rich solution was more than the restrictive value, where the precipitation rate of vanadium and the purity of V2O5 were low. However, the precipitation rate of vanadium reached 99.43% and the purity of V2O5 was 99.32% by removal of phosphorus with 0.8 g CaCl2 per liter real vanadium-rich solution.

關鍵字

Impurity Ions ； Vanadium Precipitation ； Separation ； Purification ； Vanadium-Bearing Titano-Magnetite