工業用清潔劑中有毒成分之分析

Highly Toxic Substances Found in Local Industrial Removers by GC-MS Spectrometry

林隆清(Lung-Ching Lin) ； 王青柏(Ching-Bore Wang) ； 謝圳卿(Chun-Chin Hsieh)

《化學》 64年4期 (1975/12) Pp. 123-125

https://doi.org/10.6623/chem.1975020

摘要

利用氣相層析-質譜儀(gas chromatograph-mass spectrometer)，測定電子公司所用清潔劑(remover)中所含微量的劇毒成分：四氯化碳、四氯乙烷及光氣。

並列摘要

A highly toxic substance, tetrachloroethane, was found to be contaminated in commercial ＂tetraclene＂ removers used in local electronic firms. The GC-MS spectrum showed the molecular ion peak at mle 166. The ratio of isotope peaks P:P+2:P+4 was determined to be 3:4:2 which is a firm evidence that the molecule contains 4 chlorine atoms. The nmr spectrum showed only one single peak at τ4.06, which is consistent with Cl_2HCCHCl_2 in the literature^2. Three highly toxic substances, tetrachloroethane, phosgen and carbontetrachloride, were found to be contaminated in commercial ＂tricIene and tetracIene 80: 20 ν/ν＂ removers used in local electronic firms. Phosgen and carbon tetrachloride were also found in commercial ＂triclene＂ removers. These trace substances were detected by means of GC-MS Spectrometry as well as nmr spectrometry.