- 期刊
化學氣相沉積配位化合物：基本物性控制與合成策略
Coordination Compounds as CVD Precursors: Strategies for Tuning Their Chemical and Physical Properties
並列摘要
Chemical vapor deposition (CVD) has emerged to become a popular technology in preparing various metal and metal-containing thin-film materials for microelectronic applications. This article describes the design strategies and fundamental principles of modifying metal-organic CVD source complexes, based on the concept of organic, organometallic and coordination chemistry.
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