摘要
在本論文中，我們利用理論分析模擬和實驗驗證，提出利用全像干涉方法製造有缺陷和完美的光子晶體。在分析製造光子晶體的方法時，我們提出兩種不同的步驟，一種是從已知光子晶體的晶格常數去計算出所需要的雷射波長和波向量﹔另一種則正好相反，從已知雷射波長和波向量去計算所得到的光子晶體之晶格常數，我們並利用電腦模擬來說明這兩種步驟和比較其間的差異。在分析有缺陷的光子晶體時，我們利用重覆曝光和把記錄介質沖洗到高對比的方法，並適當的控制雷射的強度，可製造出有線缺陷的全像光子晶體。接著我們利用一個獨特且對稱的光學實驗架構來製造有缺陷和完美的光子晶體。在高介質常數的假設下，我們試著去分析所製造出之光子晶體的能帶結構和波在有缺陷的光子晶體中傳播特性。最後我們討論這種利用全像製造光子晶體之方法的優點和限制，並建議未來所研究的方向。
並列摘要
In this thesis, we have presented a theoretical analysis and experimental demonstration for the creation of holographic photonic crystals with and without defects. In making the holographic photonic crystals, we have described two distinctively different approaches. One approach is to first determine the lattice constants and then use them to determine the laser wavevectors and wavelength. The other is vice versa. We have used computer simulation to illustrate both of the approaches and compared their differences. Line defects can be created holographically in the photonic crystals by an additional exposure with proper intensity and then develop the recording medium to high contrast. We have then used a unique symmetrical optical architecture to create the holographic photonic crystals with and without defects. We have analyzed the band structures and wave propagation properties of the photonic crystals by assuming them as made of a few practical dielectric constants. Finally, we have discussed the advantages and constraints of our method and suggested future research work.
參考文獻
延伸閱讀
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