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  • 學位論文

精微圖案毛細管塗佈之研究

The Development and Application of Capillary Coating Technology in Micropattern

指導教授 : 王安邦

摘要


印刷技術因為其設備便宜、製程時間短及材料使用率高已漸漸成為電路製造之重要技術,其中又以網印及噴墨技術最為普遍,但在這兩種技術中仍有諸多限制,在網印技術其塗佈材料需為高黏度流體(>1000cP),且製作精度不高(<40μm),更重要的是當圖案改變時須重新製作網版。而噴墨技術雖然可以不須製作模板且精度高(~50μm),但其適合塗佈之材料黏度範圍過小(<30cP),使得材料選用上受到限制,為了用於高精度且應用黏度範圍介於噴墨及網印之間,本研究中開發一新型精密塗佈技術,此技術主要利用毛細管製作出微米等級之塗佈頭,當針尖碰觸塗佈基板時利用基板與流體的沾附力將流體塗佈上去,此技術具有圖案可變動性高、可塗佈出微米等級的圖案、材料使用率高、製程簡單等優點。而為了更加了解此技術的特性及測試其工業化之可行性,吾人實際應用於銀導線製作,並藉由改變塗佈頭的大小(D)、塗佈機板的速度(V)、針尖與基板之距離(G)及管內塗佈流體之高度(H),觀察以上各參數對塗佈後之乾膜線寬(W)、乾膜厚度(T)、電阻值(R)及電阻率(ρ)之影響。

並列摘要


Printing technology becomes more and more important for circuitry manufacture, due to the advantages of cheap equipments, low time consuming and high material utility rate. There are many kinds of methods have been developed, among which screen printing and inkjet printing are the most popular technologies. However, these two technologies still have some problems and limitations. Screen printing has the limitations of low pattern resolution (>40μm) and high operation material viscosity (>1000cp). Moreover, the screen mesh has to remake if the pattern is changed. The maskless technology, inkjet printing, can produce high resolution patterns (~50μm), but it is also limited by the materials viscosity (<30cP). Here, we have developed a kind of direct patterning technology, capillary coating, to pattern silver ink (~240cP). Different sizes of capillary tubes (20 μm -200 μm) have been tested to directly “write” the arbitrary patterns of circuits on glass and PET substrates. To control circuit morphologies and circuit electricity, such as width (W), thickness (T) resistance (R) and resistivity (ρ), the operation parameters have been investigated as followings: head diameter (D), coating velocity (V), tip-to-substrate distance (G), and liquid altitude inside the capillary (H). These results will be summarized and reported in this article.

並列關鍵字

Direct-writing Capillary coating silver ink

參考文獻


[43]James C. Wyant “ White Light Interferometry” Optical Sciences Center, University of Arizona, Tucson, AZ 85721
[1]Han, S. J., J. Derksen, et al. "Extrusion spin coating: An efficient and deterministic photoresist coating method in microlithography." IEEE Transactions on Semiconductor Manufacturing (2004) Volume 17.
[2]Kistler and Schweizer, ”Liquid Film Coating” ,CHAPMAN & HALL
[4]Richard Brown “RF/Microwave Hybrids: Basics, Materials and Processes”, 2002 Springer; 1 edition
[8]Danny Banks , “Microengineering, MEMS, and Interfacing: A Practical Guide”, CRC Press; 1 edition

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