在石英振盪器中含有一細小的石英音叉,石英其擁有準確的振動頻率32768赫茲,本篇論文中主要是要完成此石英音叉外型的製作。首先要設計製作出一套穩定的溫度控制環境,以便於每次蝕刻都可以得到穩定的結果。 接著研究出石英在各角度方向經由不同配方以及不同溫度條件下所蝕刻出來的外觀,觀察石英經過氫氟酸蝕刻後,其各方向的蝕刻速率以及外型輪廓,以及石英其隨著時間蝕刻時的外型變化。 得到石英蝕刻的速率後,接著開始音叉的製作,而由於市面上並無法購買到合乎尺寸厚度的晶片,因此設計出一套晶片薄化的製程,以便於製作石英音叉。 最後發現到由於表面粗糙度的問題,以至於鉻金薄膜無法在時間內抵擋住氫氟酸蝕刻而剝落,導致實驗失敗。因此便研究,經過研磨後的晶片,其本身要拋光至何種粗糙度下,才能夠使得所鍍的薄膜能夠在蝕刻時間內抵擋住氫氟酸的侵蝕。
In the quartz resonator, there is a small quartz tuning fork. The quartz has accurate vibration frequency of 32,768 Hz. This paper is mainly to complete the production of the quartz tuning fork. We build an environment with stable temperature, so as to get stable results in each etching test. Then we come up with the appearance of quartz in each angle direction through the different formulations and different temperature conditions. Besides, we will etched quartz with hydrofluoric acid and observe the etching rate of the quartz, the shape of quartz, and appearance changes of quartz through the etching time. After we get the quartz etching rate, we start to produce the tuning fork. Because we can’t purchase the fit size of the thickness of the wafer in the market, we designed a wafer thinning process for the production of quartz tuning fork. Finally we found the problem is the surface roughness which may cause Cr-Au films unable to withstand hydrofluoric acid etching in time, so the films peel off, and the research is fail. Therefore, we find a technique of polish the quartz. We know to which degree of roughness should we polish the quartz, and it will be able to make the thin-film to resist the erosion of hydrofluoric acid etching.