彩色濾光片黑色矩陣複合材料之研究

本研究中成功合成出具有-COOH官能基之鹼可洗紫外光可硬化樹脂，在與碳黑混合後可得黑色矩陣光阻劑，再利用微影製程得到線寬100μm、膜厚約1μm之線路圖案，且光學密度值達4.0以上之黑色矩陣。在所合成之鹼可洗紫外光可硬化樹脂部分，第一種為高分子型:首先利用羥乙基甲丙烯酸酯(2-hydroxyethyl methacrylate)與二異氰酸甲苯(toluene 2,4-diisocyanate)反應形成具有異氰酸基之預聚物；再導入預先合成之丙烯酸(acrylic acid)-甲基丙烯酸苯酯(benzyl methacrylate)-羥乙基丙烯酸酯(2-hydroxyethyl acrylate)共聚物，利用剩餘之異氰酸基與羥乙基丙烯酸酯上之羥基反應，最後可得具有不飽和乙烯鍵之感光性樹脂。第二種為環氧壓克力樹脂改質型: 先利用二異氰酸異佛爾酮(isophorone diisocyanate)與羥乙基甲丙烯酸酯(2-hydroxyethyl methacrylate)反應得具有異氰酸基之預聚物，再導入預先合成之馬來酸酐(maleic anhydride)與環氧壓克力樹脂行開環反應而得酸化之環氧壓克力樹脂，利用剩餘之異氰酸基與酸化後所產生之酸基反應，最後同樣可得具有不飽和乙烯鍵之感光性樹脂。實驗中利用傅立葉轉換紅外光光譜儀及核磁共振儀進行樹脂官能基變化之監控與鑑定、再以凝膠滲透儀分析所得樹脂之分子量，最後利用酸鹼度計測量所合成樹脂之酸度。在製備黑色矩陣光阻劑部分，將碳黑(carbon black)、樹脂、高分子型分散劑、丙二醇甲醚醋酸酯(PGMEA)、光起始劑、膜平坦劑及氧化鋯磨球混合後，以球磨製程後可得分散均勻之黑色矩陣光阻劑，最後以動態光散射分析儀及穿透式電子顯微鏡觀察碳黑之分散情況，結果顯示碳黑可均勻分散至50~150nm。利用旋轉塗佈將光阻劑塗佈於玻璃基材上，經過預烤後利用微影製程進行曝光顯影，曝後烤後以光學顯微鏡與掃瞄式電子顯微鏡觀察線路的外觀形態及膜厚，並以熱重損失分析儀測試所得材料之熱性質。本研究結果可得線寬100μm、膜厚1μm且光學密度值達4.0以上黑色矩陣之線路圖案。

關鍵字

鹼可洗紫外光可硬化樹脂；碳黑；分散；黑色矩陣；微影製程；光學密度值

並列摘要

The synthesis of alkali soluble UV-curable resins with carboxyl group had been fully-developed in this study. After well-mixed with carbon black, the ultra-thin pattern with optical density up to 4.0 could be obtained via the lithography process. There were two types of the UV-curable resins. One was the polymeric type UV-curable resin. The copolymer (poly(acrylic acid)-co-(benzyl methacrylate)-co-(2-hydroxyethyl acrylate)) was reacted with the oligomer, which was pre-synthesized by toluene 2,4-diisocyanate(TDI) and 2-hydroxyethyl methacrylate(HEMA) and hence the polymeric type UV-curable resin was formed. Another one was the modified epoxy acrylate type UV-curable resin. The prepolymer synthesized by the ring-opening reaction of maleic anhydride and acidification epoxy acrylate was reacted with the oligomer, which was pre-synthesized by isophorone diisocyanate(IPDI) and 2-hydroxyethyl methacrylate(HEMA) to form the modified epoxy acrylate type UV-curable resin. The Fourier transfer infrared spectrometer and nuclear magnetic resonance were utilized to monitor and identify the functional groups of the synthesized resins. And the gel permeation chromatography was used to analyze the molecular weight of the UV-curable resins. The PH meter was utilized to evaluate the acid value of resins. The photo-resist was prepared by mixing up carbon black, resin, polymeric dispersants, propylene glycol monomethyl ether acetate(PGMEA), photo initiator and leveling agent, and followed by the ball mixing process with Zirconium oxide beads. A dynamic light scattering analyzer and transmission electron microscope was utilized to analyze the distribution of carbon black. As a result the narrow size distribution of carbon black between 50~150nm can be obtained. The UV-curable resist was spin-coated on the glass substrate to form a thin film. After pre-baking and lithography technique, the patterns with line-width 100μm can be achieved. An optical microscope and scanning electron microscope were utilized to observe the morphology and the thickness of this thin film. The thermal property of this thin film was studied by a thermogravimetric analyzer. As a result, the ultra-thin film with 1μm thickness and optical density up to 4.0 can be obtained.

並列關鍵字

Alkali soluble UV-curable resin ； Carbon black ； Dispersion ； Black matrix ； Lithography ； Optical density

參考文獻

6. 陳偉源, “彩色濾光片之高光學密度黑色矩陣研究”國立台灣大學高分子科學與工程學研究所碩士學位論文,(2002).

4. Accorsi, J Romero, Eduardo, “Special carbon blacks for plastics”, Plastics Engineering, April 01, 29. (1995)

8. T. C. Patton, “Paint flow and pigment dispersion”, John-Wiely & Sons Inc., New Jersey, USA. (1978)

15. Yining Lin, Thomas W.Smith, and Paschalis Alexandridis, “Adsorption of a Polymeric Siloxane Surfactant on Carbon Black Particles Dispersed in Mixtures of Water with Polar Organic Solvents”. Journal of Colloid and Interface Science 255, 1-9.(2002)

17. Decker, C., UV-radiation curing chemistry. Pigment & Resin Technology, 30(5): p. 278-286(2001).

國際替代計量

彩色濾光片黑色矩陣複合材料之研究

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