以奈米壓印及刻劃技術探討鍺奈米線及高分子材料之機械性質

奈米科技為人類第四次工業革命，由於奈米時代的來臨，奈米尺寸的元件或材料一一被提出，對於材料的機械性質，例如楊氏模數或硬度的瞭解是絕對必要的工作。本論文首先探討的主題為鍺奈米線的性質，所使用的測量工具為原子力顯微鏡，所根據的基礎理論為奈米壓痕量測理論。希望藉此量測出鍺奈米線的性質，以利未來的應用。實驗的主要目的，在利用原子力顯微鏡探針壓印鍺奈米線，並計算出其楊氏模數。實驗的第一步是校正光感測器電壓信號值與Z軸壓電驅動器位移之間的轉換常數以及壓印接觸面積函數。實驗的第二步是利用AFM探針壓印HCPP高分子材料並與MTS Nano Indenter的數值做比較以驗證AFM壓印的有效性。實驗的最後一步便是將鍺奈米線撒佈在鍍上金薄膜的晶圓上，藉以利用金薄膜與鍺奈米線性質的不同來確定是否壓印到鍺奈米線，並計算出鍺奈米線的楊氏模數為155GPa。本論文的第二部分是探討材料抗磨耗的特性。本實驗利用奈米壓痕試驗機（Nano Indenter）作刻劃的實驗並且利用雷射反射共軛聚焦顯微鏡（Confocal Microscope）來觀察材料的表面性質。並且探討材料硬度、楊氏模數、時變效應以及刻劃子外形與速度、負載之間的關係，以期能為未來發展刻劃理論數學模型建立一良好的基礎。

關鍵字

奈米壓印；楊氏模數；原子力顯微鏡；刻劃；鍺奈米線

並列摘要

It is said that nano technology is the forth industrial revolution. Along with the arrival of nano era, a lot of nano-scale components or materials have been proposed. Therefore, it is an absolutely necessary task to study the mechanical properties such as Young’s Modulus and hardness, etc. of the materials. The first objective of this thesis is to investigate the properties of Ge nanowires. The apparatus for investigating Ge nanowires is atomic force microscopy, AFM. And the experiment is based on nanoindentation theory. It is expected to measure the properties of Ge nanowires for the further application in the future. The main purpose of the experiment is to indent on the Ge nanowires and derive its Young’s Modulus. The first step of the experiment was to calibrate the optical signal to Z piezo actuator displacement constant and the contact area function. Secondly, HCPP, a polymer, was indented with AFM. And the material properties acquired was compared with the data acquired by MTS Nano Indenter to validate the effectiveness of AFM indentation. Finally, Ge nanowires were dispersed evenly onto the wafer which was coated with Au film. By means of different properties possessed by Au and Ge nanowires, whether or not the Ge nanowires had been indented was known. Then the Young’s Modulus of Ge nanowires were shown to be 155GPa. The second part of this thesis is to characterize the abilities of different polymers to resist abrasion or scratching. Nano Indenter was used to perform scratch tests and Confocal Microscope was used to observe surface conditions of samples. The correlations between different factors such as hardness, Young’s Modulus, Time-dependent effects, shape of scratch tip, velocity and load were studied. The results can be contributed for setting up a sound foundation for building up a math model of scratching.

並列關鍵字

scratch ； Ge nanowire ； Nano Indentation ； Young’s Modulus ； AFM

參考文獻

[1] M. R. Vanlandingham et al., “Nanoscale Indentation of Polymer Systems Using the Atomic Force Microscope,” J. Adhesion, Vol. 64, pp. 31-59, 1997.

[2] R. W. Stark et al., “Determination of Elastic Properties of Single Aerogel powder particles with the AFM,” Ultramicroscopy , Vol. 75, pp. 161-169, 1998.

[3] S. Sundararajan et al., “Mechanical Property Measurements of Nanoscale Structures Using an Atomic Force Microscope,” Ultramicroscopy, Vol. 91 pp. 111-118, 2002.

[4] D. Raghavan et al., “Characterization of Heterogeneous Regions in Polymer Systems Using Tapping Mode and Force Mode Atomic Force Microscopy,” Langmuir, Vol. 16, pp. 9448-9459, 2000.

[5] Binyang Du et al. “Study of Elastic Modulus and Yield Strength of Polymer Thin Films Using Atomic Force Microscopy,” Langmuir, Vol. 17, pp. 3286-3291, 2001.

國際替代計量

以奈米壓印及刻劃技術探討鍺奈米線及高分子材料之機械性質

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