利用純量繞射理論探討複合式菲涅耳波帶片之聚焦特性

Using Scalar Diffraction Theory to Study the Focal Properties of Composite Fresnel Zone Plate

劉展瑜(Zhan-Yu Liu)

指導教授 ： 李佳翰

國立臺灣大學/工學院/工程科學及海洋工程學研究所/碩士(2010年)

https://doi.org/10.6342/NTU.2010.02135

摘要

極紫外光微影術是下一世代微影技術可能的主流技術。在極紫外光的波段下，菲涅耳波帶片是非常重要的光學繞射元件之一。在固定孔徑大小以及製程極限下，具有中央擋片結構的菲涅耳波帶片不但能提供高空間解析度並且阻擋零階繞射光。若阻擋的面積越大，則空間解析度將變的更高，但同時光強則會變的更低。在這樣的結構中，空間解析度與光強是不可兼得的。在本文中，我們利用菲涅耳－克希荷夫繞射公式模擬了在極紫外光波段下共十五個不同堆疉波帶片結構，此結構分別是由增強波帶片和主波帶片所組成。我們發現這十五個結構中，有一組的空間解析度與光強相較於只具有中央擋片結構的波帶片還要來的更好。

關鍵字

光學繞射元件 ； 菲涅耳波帶片 ； 極紫外光

並列摘要

Extreme ultraviolet lithography (EUV) is one candidate of the next generation lithography. In EUV wavelength, Fresnel zone plate (FZP) is one of the most important diffractive optical elements. In a fixed fabrication limit and lens size, Fresnel zone plate with a central stop can not only provide high spatial resolution but also block the zero order diffractive light. More area blocked in the center, higher spatial resolution can be achieved but accompanied with lower light intensity. It is trade-off between the spatial resolution and light intensity in this kind of structure. In this thesis, fifteen cases of stacked zone plate which are composed by an enhancing zone plate and primary zone plate are studied by Fresnel-Kirchhoff diffraction formula in EUV wavelength. One of the cases can not only improve the spatial resolution but also enhance the light intensity as comparing with only one zone plate with central stop.

並列關鍵字

diffractive optics ； Fresnel zone plate ； extreme ultraviolet light

參考文獻

[1] E. H. Anderson, “Specialized Electron Beam Nanolithography for EUV and X-Ray Diffractive Optics,” IEEE J. QUANTUM ELECTRON. 42, 27-35 (2006).

[2] K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, and S. Huh, “Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture,” J. Vac. Sci. Technol. B 26, 2220-2224 (2008).

[4] D. S. Kim, J. J. Park, K. H. Lee, J. Park, and C. H. Nam, “Soft X-ray Microscope Constructed with 130-nm Spatial Resolution Using a High Harmonic X-ray Source,” Jpn. J. Appl. Phys. 48, 026506 (2009).

[7] W. L. Chao, J. Kim, S. Rekawa, P. Fischer, and E. H. Anderson, “Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy,” Opt. Express 17, 17669-17677 (2009).

[8] W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson, and D. T. Attwood, “Soft X-ray microscopy at a spatial resolution better than 15 nm,” Nature 435, 1210-1213 (2005).