電漿子奈米蝕刻技術之設計與開發

Design and Development of Plasmonic Nano-Lithography Platform

許濬凡(June-Fan Hsu)

指導教授 ： 吳文中

共同指導教授 ： 李世光(Chih-Kung Lee)

國立臺灣大學/工學院/工程科學及海洋工程學研究所/碩士(2007年)

https://doi.org/10.6342/NTU.2007.01207

摘要

本篇論文以Xiangang Luo 及 Teruya Ishihara等人所研發的表面電漿子微影術為起點進而研究耦合型電漿子共振模態。期望能藉此對開發奈米蝕刻技術的原型開發平台有所貢獻。
　　理論方面，推導物理模型和理論及以數值方法解析，使能預測兩種耦合型模態的激發條件，並依光柵週期來選擇所激發模態，以有限時域差分法計算電磁場分布及以數學軟體做資料分析。藉此設計三種激發的遮罩，確認其可行性，同時也可與之前的理論推導相印証。
　　實驗方面，使用聚焦離子束和電子束微影術來製作遮罩，經過我們使用負型電子阻改良金屬剝離製程後，電子束微影術可更適合製作近場金屬遮罩，也包含本研究所需的表面電漿激發遮罩。目前已成功達成150nm 線寬製備能力。利用漸變曝光，電子束微影術也能製造正弦形狀金屬遮罩。平台架設部份，我們改裝倒立式顯微鏡輔以人機介面方便控制，使得曝光流程能自動化進行，並能將本團隊過去研發的奈米直寫儀系統整合ㄧ起，以期望能研發更完整的奈米級原型開發平台。

關鍵字

表面電漿振子 ； 電漿子微影術 ； 耦合型表面電漿模態 ； 電子束微影術 ； 金屬剝離製程 ； 微小化光機

並列摘要

This thesis took the plasmoic lithography first proposed by Xiangang Luo and Teruya Ishihara et al as the starting point to study the coupled-surface plasmon (SPP) resonance modes. It is anticipated to utilize the learning from the course of this research to develop a nanolithography platform for prototype development.
In the theoretical part, I have derived the physical model and solved the governing equations by using numerical method Nelder-Mead Simplex algorithm. It enables us to find out how to excite the coupled mode by selecting a correct period of the metal grating. The dispersion curves for coupled modes were successfully solved and plot by home-made MATLAB programs. In simulations, we use finite difference time domain (FDTD) to calculate the electromagnetic fields and data analysis by the using MATLAB. We designed three kinds of mask for plasmonic lithography and checked their practicality. Simulation results were verified by using the theoretical prediction.
In experiments, we produced the masks by focused ion beam (FIB) and electron beam lithography (EBL). By integrating metal lift-off process and our newly tried negative resist, EBL were identified to be a powerful tool to produce near-field metal masks including for plasmonic lithography. Its efficiency was found to be even higher than that of FIB. Features of 150 nm in size have been made successfully. The sinusoidal metal grating was also fabricated through the gradient exposure by EBL. For the platform, we retrofit the inverted microscope into a nanolithography platform. It can be controlled automatically by using a friendly interface developed by LabVIEW. This mini exposure system was identified to be suitable for integrating with the nanowriter developed by our Nano-BioMEMS Group since 2003.

並列關鍵字

Surface-Plasmon Polariton ； Plasmonic Lithography ； Coupled Surface-Plasmon Polariton modes ； Electron Beam Lithography ； Metal lift-off process ； Minituralized Plasmonic Nanolithography Platform

參考文獻

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2. X. L. a. T. Ishihara, "Subwavelength photolithography based on surface-plasmon polariton resonance," OPTICS EXPRESS 12, 3055-3065 (2004).

3. B. J. Lin, "The ending of optical lithography and the prospects of its successors," Microelectronic Engineering 83, 604-613 (2006).

4. J. W. Goodman, INTRODUCTION TO FOUREIR OPTICS (McGraw-Hill Book Co.).

6. C. M. Masashi Kuwahara, Nobufumi Atoda, Junji Tominaga, Hiroshi Fuji, Takashi Kikukawa A Thermal Lithography Technique Using a Minute Heat Spot of a Laser Beam for 100 nm Dimension Fabrication (Springer Berlin / Heidelberg, 2003).