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  • 學位論文

新型微小化合成分布式電阻電容傳輸線與其應用在金氧半導體製程中之濾波器設計

A Novel Compact Synthetic Distributed-RC Transmission Line and Its Application to CMOS Filters Design

指導教授 : 莊晴光

摘要


本文中提出了在0.18 微米互補是金氧半導體製程中的一個新的分佈式電阻電容傳輸線的實現方法,使用製程中的細金屬,並以合成傳輸線的概念來設計這個新的傳輸線結構。在提出此傳輸線的數學模型之後,利用此傳輸線設計了一個凹口濾波器,此濾波器工作頻率為2400 兆赫同時佔用了80 微米乘65 微米的晶片面積。此外,一個使用此傳輸線的280 兆赫的主動式帶通濾波器也在本文中被提出,晶片面積為370 微米乘420 微米。由此二濾波器的量測結果可知傳輸線的設計在此半導體製程中是適用的,在本文的最後,也提出了一個使用此分佈式電阻電容線的主動低通濾波器的設計。

關鍵字

合成傳輸線 濾波器

並列摘要


This thesis proposes a new geometric implementation of distributed-RC lines using thin metal wires in modern 1P6M 0.18um CMOS process. These distributed-RC lines are designed on the basis of synthetic transmission lines. Immediately after providing mathematical models for those lines, a passive notch filter occupying 80um by 65um chip area with 2.4GHz null frequency is designed and tested. Moreover, one 280-MHz active distributed-RC band-pass filter occupying 370um by 420um chip area is also implemented to verify concepts of those lines. The measured results of these two filters show feasibility of distributed-RC lines on CMOS process. Finally, design of an active low-pass filter is given in the end of this thesis.

並列關鍵字

Synthetic Transmission Line Filter

參考文獻


[1] W. M. Kaufman, “Theory of a Monolithic, Null Device and Some Novel Circuits,” Proc. IRE, vol. 48, pp. 1540-1545, Sep. 1960.
[2] P. L. Swart, and C. K. Campbell, “A Voltage-Controlled Tunable Distributed-RC Filter,” IEEE J. Solid-State Circuits, vol. 7, pp. 306-308, Aug. 1972.
[3] E. S. Kolesar, Jr., “Effects of Thin-Film Spin-on Glass Dielectric Loss on the Performance of the Uniformly Distributed-RC Notch Network,” IEEE Trans. Components, Hybrids & Manufacturing Tech., vol. 14, pp. 413-419, Jun. 1991.
[4] J. A. Carson, C. K. Campbell, P. L. Swart and F. J. Vallo, “Effects of Dielectric Loss on the Performance of Evaporated Thin-Film Distributed-RC Notch Filters,”
IEEE J. Solid-State Circuits, vol. 6, pp. 120-124, Jun. 1971.

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