掃描式探針顯微鏡於奈米微影之Mu合成控制

Mu synthesis Control of Scanning Probe Microscope for Nanolithography

張景翔(Ching-Hsiang Chang)

指導教授 ： 顏家鈺

國立臺灣大學/工學院/機械工程學研究所/碩士(2004年)

https://doi.org/10.6342/NTU.2004.01299

摘要

本文藉由刮掉標本表面提出2維的掃描式探針顯微鏡微影。以前的研究已經證明伺服控制器對微影有重要影響，精心設計的控制器可以完成更均勻的微影記號。本篇研究指出當連續微影若干直線時能夠觀察釵h未預料到的影響，試片表面上的材料受到探針的推擠而上昇成犁狀形狀的邊緣，此時當我們試著擴大這個溝渠的寬度時，犁狀記號會變得參差不齊。本篇論文也顯示經由謹慎地操作微影過程，我們的確可能獲得較平緩的微影圖形。此外，我們也引入Mu合成控制器，在設計過程我們可以看到其整體的結果表現，實驗結果符合這些設計規格。

關鍵字

定力控制 ； 掃描探針微影術 ； Mu合成控制 ； 奈米微影 ； 原子力顯微鏡

並列摘要

This thesis addresses the 2-dimensional scanning probe microscope (SPM) lithography by scratching the sampling surface. The previous research has shown that servo controller has significant effect on the lithography. Carefully designed controller achieves more uniform scratch marks. This research has demonstrated that many unexpected effect can be observed when marking multiple lines. The material on the sample surface piles up on the sides of the plow mark. The plow mark would then become uneven when one tries to widen the ditch. The study also shows that it is possible to achieve more even marking geometry by carefully operate the cutting procedure. A Mu-synthesis controller is also presented to show how the outcome performance can be incorporated at the design stage. The experimental results confirm the design specifications.

並列關鍵字

SPM lithography ； Nanolithography ； Mu synthesis ； AFM ； force control

參考文獻

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