微影成像模擬使用同調與部份同調光源

Microlithography Imaging Simulation with Coherent and Partially Coherent Light Sources

鍾士勇(Shih-Yung Chung)

指導教授 ： 陳中平

國立臺灣大學/電機資訊學院/電子工程學研究所/碩士(2006年)

https://doi.org/10.6342/NTU.2006.02133

摘要

現今半導體製程中，微影是極為重要的一環。當製程低於90奈米時，為因應光學鄰近效應而修改光罩是必然的步驟，而成像模擬可利用電腦的快速運算來達到快速修正光罩的效用，故此論文著重於利用冪級數展開或是函數展開方式把光學成像公式實作於電腦程式上。

關鍵字

微影成像 ； 部份同調光源

並列摘要

At the present days, the key and critical part of industrial IC manufacture is
the optical lithography technology which can duplicate the design patterns at
the mask onto wafer by light exposure.The most direct and accurate simulation is the imaging of
patterns on wafer. Accurate imaging simulation can show exposed and unexposed
regions after photolithography by computer. We propose an analytical solution for Hopkins
formula that we don't need to transfer the mask patterns into
frequency domain or convolve them with the kernels. Actually, we can directly
compute the image intensity of each single pixel by using integration of power
series or polynomials of the kernals.

並列關鍵字

microlithography simulation ； partially coherent

參考文獻

[1] J. W. Goodman, Introduction to Fourier Optics, 2nd ed. McGraw Hill, 1996,

[2] E. Wolf, “Coherent-mode propagation in spatially band-limited wave fields,”

Optical Society of America, 1986.

aerial image computation for integrated circuit patterns,” IEEE, 1997.

circuit manufacturing,” the University of Berkeley, 1998.