本研究為如何製作出微探針陣列,而微探針陣列本身又分成平面式或垂直式,平面式為早期較多人研究的重心,而目前由於晶片須要縮小化,又必須增加採血機率,在垂直式的應用與研究上才較受到重視,在這裡目標是以垂直式的微探針陣列為主,利用乾式蝕刻來製作,除了省時,又能避免不必要的危險,如利用到等向性蝕刻液則勢必會用到HNA蝕刻液,而HNA本身須要使用到氫氟酸,氫氟酸是一種強酸且大多數材料無法阻擋其蝕刻,因此在製作上若使用的話,必須格外小心,為了改良這個部分,本研究利用電感耦合電漿蝕刻機來完成等向性的蝕刻,再搭配非等向性蝕刻,製作出節省空間又可達到我們所須長度之微探針陣列,當然在製作完之後,必須測其強度,而微探針陣列製程與強度量測上,對於往後的生醫晶片整合上將會有很大的幫助與發展潛力。
How to fabricate microneedle array is the purpose of the research,. There are two kinds of microneedle array that we can find, one is in-plan microneedle arrays and another is out-of-plan microneedle arrays. In the early almost people focus on in-plan microneedle. Because we need smaller chips and to improve probability of getting blood, now people pay more attention on the application and research of out-of plan microneedle arrays. Using dry etching to fabricate out-of-plan micronedle arryas is the purpose of this research. Using this way can save time and escape unnecessary dangerous. In general people use wet etching to fabricate microneedle arrays. Isotropic etching liquid is HNA which include HF. HF is the most dangerous sour in chemical. Almost material can’t resist HF. So if we use HNA to fabricated microneedle array, we should be more carefully. In order to improve this problem, we use inductively couple plasma (ICP) to complete isotropic etching in this research. And we can try to collocate anisotropic etching to fabricated microneedle arrays that save more space and more height. After fabricating, we should measure the strength of microneedle arrays. This will be helpful to Integrate bio-chip.