奈米材料在灰階光罩與光子晶體製作上之研究

The Study of Nano Materials for Gray-Scale Masks and Photonic Crystals Fabrications

林彥辰(Yan-Chen Lin)

指導教授 ： 陳學禮

國立臺灣大學/工學院/材料科學與工程學研究所/碩士(2005年)

https://doi.org/10.6342/NTU.2005.02272

摘要

在本篇論文中，研究的主題分為兩個部分。其一為探討厚膜的環氧樹酯阻劑在製作灰階光罩上之應用。另一部份將探討利用奈米級的粒子來製作三維光子晶體的蛋白石結構。
由於傳統上所製作的灰階光罩其解析力不足且成本高，還具有在蝕刻轉移上的校正錯誤，因此我們將提出利用簡單的微影製程技術配合環氧樹酯阻劑可以製作具有漸層結構的特性，將環氧樹酯阻劑應用在灰階光罩中。首先瞭解環氧樹酯阻劑的光學特性，研究其在不同曝光波長下製作灰階光罩的條件。
由於環氧樹酯阻劑在曝光波長為I-line以及G-line時的吸收不夠大，我們嘗試藉由添加奈米材料以及改變微影製程參數，來製作環氧樹酯阻劑在I-line與G-line曝光波長下的灰階光罩。另外，藉由奈米材料的加入，探討環氧樹酯阻劑在電子束微影製程下的影響，以及環氧樹酯阻劑蝕刻的特性，並且與多晶矽比較其蝕刻率及蝕刻選擇比。
而在三維光子晶體的蛋白石結構中，將先觀察在不同環境參數下，蛋白石結構的能隙特性，來得到良好的能隙品質。此外，我們將兩種不同粒徑粒子相混來製作蛋白石結構，藉由理論配合實驗上的量測，來微調其能隙位置，並且判斷兩種粒子的分佈情形，配合掃瞄式電子顯微鏡的觀察，來驗證我們所提出的假設。

關鍵字

灰階光罩 ； 奈米材料 ； 光子晶體 ； 蛋白石結構

並列摘要

In this thesis there are two topics in our research. First we will discuss the property of epoxy resin resist and make an application in the fabrications of gray-scale masks. Secondarily we will fabricate 3D photonic crystals, i.e. opal structures by monodispersed colloidal spheres, and discuss the property of photonic band-gap.
Owing to the general manufacture of gray-scale masks has some disadvantage, such as insufficient resolution, high cost, and alignment errors in the transition etching, we will bring up a design to fabricate gray-scale masks by simple lithographic process. Since the epoxy resin resist has some superior characteristics in mechanical and thermal property, and provides oblique structure in nanofabrications, we can fabricate gray-scale masks with epoxy resin resist. First we will realize the optical property of epoxy resin resist, and find out the fabrication parameters of gray-scale masks in different exposure sources of lithography process.
Because of the weak absorption at I-line and G-line, we try to add some nano materials with absorption property and adjust the parameters of lithographic process. We can use epoxy resin resist to fabricate gray-scale masks at I-line and G-line. In addition, with adding nano materials we will discuss the resist property of epoxy resin in the electron beam lithography. At the same time we will discuss the etching property with adding nano materials and compare the etching selectivity and etching rate with poly-silicon.
For opal structures with 3D photonic crystals characteristic we first observe the band-gap property of opal in different conditions and find out the better quality of opal. In addition we mix monodispersed colloidal spheres with two different diameter to fabricate binary opal. By the measurement in this experiment and the calculations in the theory we can tune the band-gap site with less change. At the same time we will suppose the distribution of binary opal and use scanning electronic microscopy to observe, we can test and verify our suppose.

並列關鍵字

gray-scale masks ； nano-materials ； photonic crystals ； opal structure

參考文獻

[1] M. Born and E. Wolf, “Principles of Optics : Electromagnetic Theory of Propagation, Interference and Diffraction of Light”, Oxford, New York (1980)

[2] A. D. Krawitz, “Introduction to Diffraction in Materials Science and Engineering”, John Wiley, New York (2001)

[5] Y. Oppliger, Microelectronic Engineering, 23, 449 (1994)

[6] W. Daschner, J. Vac. Sci. Technol. B, 13, 2729 (1995)

[9] T. Ishii, H. Nozawa and T. Tamamura, Microelectr. Eng., 35, 113 (1997)