- 學位論文
電子束顯影技術與其應用在幫助在鍺量子點的成長
Electron Beam Lithography Technology and Application on the Mesas to Assist Germanium Quantum-Dots Growth
並列摘要
In all fields of technology, nano-technology is today’s buzzword. The applications of the nanometer-order technology are needed, for example, in IC processing, optoelectronic devices, DNA researching, and micro machining. Nano-technology can be roughly divided into non-semiconductor-based field and semiconductor-based field. Because semiconductor-based technology has the advantage of process integration, mass and uniform production can be achieved. Electron beam lithography system plays an important role in nano-technology. It is capable of exposing nano-patterns that photolithography fail to do. In this thesis, we will mainly introduce the ELS-7500EX, an electron beam lithography system provided by ELIONIX, and exploit it to delimit nano-patterns, such as lines and circles. In addition, the study of using electron beam lithography system (EBLS), reactive ion etching (RIE) and ultra high vacuum chemical vapor deposition (UHV-CVD) to form Ge quantum dots on silicon mesas is discussed.