紫外光發光二極體於微影製程的應用

本研究之目的為利用紫外光發光二極體於微影製程之中，期望藉由紫外光發光二極體的壽命長及快速點亮等優點，取代目前曝光系統中的汞燈。在系統設備上，首先於無塵室中建立接觸式的曝光機台，以提供實驗測試光源用途；其中機台主要包括觀測系統、微調載台及光源模組。光源則是將不同數量的紫外光發光二極體安置於鰭片之上，分別製作第一、二、三型的光源模組，其中第一型光源六顆為1 W的發光二極體，其餘二、三型分別由七顆與十二顆3 W的發光二極體所組成。在光源特性的改善上，本研究目前共使用球面反射鏡、拋物面反射鏡杯、平行透鏡與平行板來增進光源強度與平行性的特性，並將其應用至S1813的光阻製程，完成後的顯影圖案再利用影像軟體進行線寬量測，最後統計出在不同受光區域中所能完成的最小線徑。經統計的結果顯示，單顆的光源在使用球面反射鏡能成功完成20 um的線寬，但單顆的強度太低，使曝光時間需花費5分鐘。而拋物面反射鏡杯的使用可減少因為多光源所造成的複影現象，但仍是無法完全消除，不過反射鏡杯的使用可將紫外線強度提升6~10倍，並且將視角由原本140度縮小至30度。平行透鏡的使用結果雖可消除複影，但卻會因為光源並非點光源而產生光點。而平行板的使用在本實驗中由於受光面積不均勻，因此出現部份區域的線條斷裂。除此之外，本研究的光源模組也實際應用於印刷電路板廠中進行曝光測試；目前已可完成75 um的線徑大小，而且將曝光時間控制於30秒內，對於應用於產業的製造上已具有可行性。

關鍵字

紫外光發光二極體；曝光機；微影製程

並列摘要

The purpose of this study is utilizing UV-LED to microlithography, and expects to take advantage of UV-LED to replace mercury lamp in exposure system because of LED had long life and quick response. In this research, we constructed the contact exposure system in clean room to provide for testing light performance. The system included observes equipment, adjustable micro-stage and light module. UV-LEDs installed on the heat sink totally had three kinds of module in this study, Type 1 composed of six 1 Watt LEDs, Type 2 and 3 had seven and twelve 3 Watt LEDs. In experiment method, we used spherical surface, parabolic reflectors, parallel lens and collimator to improve optical characteristics. After S1813 photolithography process, the patterns had been measure size and count the minimum size in every region. Besides the light modules also had been test on PCB process in factory. The result of single LED with the spherical surface can print 20 um lines on substrate, but single LED had lower intensity that caused the exposure time must spend 5 minutes to complete. The parabolic reflectors can reduce the multiple images but it can’t eliminate this phenomenon which made by multi-light source, however it can enhance UV intensity about six to ten times, also decrease view of angle from 140 degree to 30 degree. When using parallel lens it can eliminate multiple images, but the result had spot because of UV-LEDs modules are not a perfect point source. In using collimate situation, the patterns on some region showed the lines are not continuous. UV-LEDs applied on PCB process can print 75 um size, and exposure time would below 30 seconds, it shows other way and feasibility to manufacture.

並列關鍵字

UV-LED ； exposure system ； microlithography

參考文獻

林群哲。2007a。發光二極體激發之磷酸鹽類螢光粉合成及其特性研究。碩士論文。台北：國立台灣大學化學研究所。

林蘇逸。2007b。高演色性白光發光二極體之研究。碩士論文。台北：國立台灣大學光電工程學研究所。

黃宇光。2006。應用曝光模擬系統對130 nm微影製程線寬控制之探討。碩士論文。桃園：元智大學電機工程學研究所。

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紫外光發光二極體於微影製程的應用

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