摘要
本論文致力於滾輪式微結構轉印製程開發研究。利用軟微影技術可以低成本快速在非平面模具製作微結構優點，結合滾輪生產快速、連續及大面積的特點，量產微結構的元件。並使用感光性高分子阻劑材料為轉印墨水，避免轉印表面擴散，黏度易調變特性，可更廣泛應用於製作微奈米等級結構。 研究首先以PDMS軟模仁包覆在滾輪，以感光性高分子材料為轉印墨水，以曲面轉印方式將微米等級結構轉移至基板上。實驗在不同速度－壓力下進行初步觀察。發現有殘留層、擴散、剥離、傾斜偏移、變形、氣孔、轉印不完全及轉寫深度不足等問題，解決方法包括利用PDMS表面能低的特性，以預沾印去除PDMS模具上殘留層；利用真空填料方式將避免氣孔產生；並結合紫外光固化機制建立有效改善轉寫深度。最後將線寬20μm深度30μm結構，有效轉寫達95%以上。從轉印模式探討中發現，速度影響結構傾斜及偏移最甚。接著就不同壓力與速度進行系統實驗，定義出轉印成型範圍及成型區域外缺陷。最後以成型窗內參數，在四種不同製程條件下，做一轉寫再現性的統計分佈實驗，發現抽真空與固化並施的條件下可得最佳的轉寫再現性分佈。 本研究並建立一套滾輪式微轉印製程流程，實際應用其針對不同特徵微結構及市面上製作彩色濾光片遮光層及彩色光阻層材料進行轉印實驗。實驗結果，遮光層材料及彩色光阻材可有效將圖形轉移至基板，惟小深寬比結構在壓力太大下，使轉印的微結構易產生凹陷，壓力需小心調整。
並列摘要
This thesis is devoted to the development of rolling micro-stamping process. This process combines the advantages of soft mold, UV-curable resist and rolling fabrication. In this process, the soft mold made of PDMS is covered on roller surface, UV-curable ink is then coated on the PDMS mold, and through contact during rolling operation, the patterns are transferred to the resist on the substrate. Three micro-structures, i.e. grating of width 20μm and depth 30μm, grating of width 100μm and depth 30μm, and micro-lens of diameter 150μm and height 30μm, have been stamped onto the resist cured on glass substrate successfully. Several insights are also obtained from this study: (1) Coating UV-curable resin into PDMS micro-cavity and transferring to substrate by stamping achieve stable replication; (2) Applying vacuum and UV curing are key to the success of the micro-stamping process; (3) Velocity is the most important processing parameter since moving too fast will reduce the curing time; (4) Pressure is also important since too high pressure will cause distortion in mold patterns. In this study, a micro-stamping machine and system are setup, and a rolling micro-stamping process is established. The system is used successfully to print grating, micro-structures and to print black matrix onto glass substrates. The potential of the rolling micro-stamping is demonstrated.