MEMS metrology is the key technology for the mass production of the MEMS devices. The electric speckle pattern interferometry is an important measurement tool as it is with the capabilities of the optical, non-contact and full filed measurements. For the ESPI system, CCD may influence the measurement accuracy. In this study, we adopt 5-1 phase shift technique, and use cheap CCD system rather than expensive one of high speed, to construct a novel ESPI system of low cost and high accuracy. We choose the MEMS device as the main application target for our ESPI system and verify its validity. The basic experimental results show the system can be applied to the measurement of the surface profile of objects with the resolution in the micron scale.